Invention Application
- Patent Title: Apparatus for enhanced purification of high-purity metals
- Patent Title (中): 用于增强高纯度金属纯化的装置
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Application No.: US10336498Application Date: 2003-01-02
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Publication No.: US20030150293A1Publication Date: 2003-08-14
- Inventor: Kishio Tayama , Toshiaki Hodozuka
- Applicant: DOWA MINING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: DOWA MINING CO., LTD.
- Current Assignee: DOWA MINING CO., LTD.
- Current Assignee Address: JP Tokyo
- Main IPC: C22B005/16
- IPC: C22B005/16 ; C22B058/00

Abstract:
A 99.99% pure indium feed is charged into crucible 8 and heated to 1250null C. by upper heater 6 in a vacuum atmosphere at 1null10null4 Torr, whereupon indium evaporates, condenses on the inner surfaces of inner tube 3 and drips to be recovered into liquid reservoir 9 in the lower part of tubular member 11 whereas impurity elements having lower vapor pressure than indium stay within crucible 8. The recovered indium mass in liquid reservoir 9 is heated to 1100null C. by lower heater 7 and the resulting vapors of impurity elements having higher vapor pressure than indium pass through diffuser plates 12 in the upper part of tubular member 11 to be discharged from the system whereas the indium vapor recondenses upon contact with diffuser plates 12 and returns to liquid reservoir 9, yielding 99.9999% pure indium while preventing the loss of indium.
Public/Granted literature
- US06805833B2 Apparatus for enhanced purification of high-purity metals Public/Granted day:2004-10-19
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