发明申请
- 专利标题： Deposition of film layers
- 专利标题（中）： 膜层沉积
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申请号： US10254627申请日： 2002-09-24
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公开(公告)号： US20030186561A1公开(公告)日： 2003-10-02
- 发明人: Kam S. Law , Quanyuan Shang , William R. Harshbarger , Dan Maydan , Soo Young Choi , Beom Soo Park , Sanjay Yadav , John M. White
- 申请人： Applied Materials, Inc.
- 申请人地址： null
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： null
- 主分类号： H01L021/31
- IPC分类号： H01L021/31 ; H01L021/469
摘要：
A method of film layer deposition is described. A film layer is deposited using a cyclical deposition process. The cyclical deposition process consists essentially of a continuous flow of one or more process gases and the alternate pulsing of a precursor and energy to form a film on a substrate structure.
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