发明申请
US20030207042A1 Method and apparatus for low-pressure pulsed coating 有权
低压脉冲涂层的方法和装置

Method and apparatus for low-pressure pulsed coating
摘要:
A coating material is deposited on a substrate by vacuum or low-pressure pulsed detonation coating. A detonation chamber receives a detonable mixture containing a coating precursor. The detonable mixture is ignited to produce detonation products laden with the coating precursor. The detonation products are accelerated in a low-pressure or vacuum chamber and discharged through a nozzle into contact with a substrate situated in low pressure to produce a high quality coating.
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