发明申请
- 专利标题: Method and apparatus for low-pressure pulsed coating
- 专利标题(中): 低压脉冲涂层的方法和装置
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申请号: US10438978申请日: 2003-05-16
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公开(公告)号: US20030207042A1公开(公告)日: 2003-11-06
- 发明人: Shmuel Eidelman
- 申请人: Science Applications International Corporation
- 申请人地址: CA San Diego
- 专利权人: Science Applications International Corporation
- 当前专利权人: Science Applications International Corporation
- 当前专利权人地址: CA San Diego
- 主分类号: C23C004/10
- IPC分类号: C23C004/10
摘要:
A coating material is deposited on a substrate by vacuum or low-pressure pulsed detonation coating. A detonation chamber receives a detonable mixture containing a coating precursor. The detonable mixture is ignited to produce detonation products laden with the coating precursor. The detonation products are accelerated in a low-pressure or vacuum chamber and discharged through a nozzle into contact with a substrate situated in low pressure to produce a high quality coating.
公开/授权文献
- US06749900B2 Method and apparatus for low-pressure pulsed coating 公开/授权日:2004-06-15
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