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13 条记录 (耗时 0.013 秒)

    Method and apparatus for low-pressure pulsed coating
    1.
    发明申请
    Method and apparatus for low-pressure pulsed coating 有权
    低压脉冲涂层的方法和装置

    公开(公告)号：US20030207042A1

    公开(公告)日：2003-11-06

    申请号：US10438978

    申请日：2003-05-16

    申请人： Science Applications International Corporation

    发明人： Shmuel Eidelman

    IPC分类号： C23C004/10

    CPC分类号： C23C24/04 ,  C23C4/126 ,  C23C16/44 ,  Y10S977/775 ,  Y10S977/89

    摘要： A coating material is deposited on a substrate by vacuum or low-pressure pulsed detonation coating. A detonation chamber receives a detonable mixture containing a coating precursor. The detonable mixture is ignited to produce detonation products laden with the coating precursor. The detonation products are accelerated in a low-pressure or vacuum chamber and discharged through a nozzle into contact with a substrate situated in low pressure to produce a high quality coating.

    摘要翻译： 涂层材料通过真空或低压脉冲爆轰涂层沉积在基板上。 引爆室接收含有涂层前体的可爆炸混合物。 引爆的混合物被点燃以产生含有涂层前体的爆炸产物。 爆炸产物在低压或真空室中被加速，并通过喷嘴排出与位于低压下的基底接触以产生高质量的涂层。

    Dispersion comprising silicon/titanium mixed oxide powder, and green bodies and shaped glass articles produced therefrom
    4.
    发明申请
    Dispersion comprising silicon/titanium mixed oxide powder, and green bodies and shaped glass articles produced therefrom 有权
    包含硅/钛混合氧化物粉末的分散体，以及由其制备的生坯和成形玻璃制品

    公开(公告)号：US20030232149A1

    公开(公告)日：2003-12-18

    申请号：US10372411

    申请日：2003-02-25

    申请人： DEGUSA AG

    发明人： Monika Oswald ,  Klaus Deller ,  Helmut Mangold ,  Gerrit Schneider ,  Rolf Clasen ,  Markus Hornfeck

    IPC分类号： C23C004/10

    CPC分类号： C01B33/1417 ,  C03C1/02 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/42 ,  Y10S501/90

    摘要： Aqueous dispersion comprising silicon/titanium mixed oxide powder with a BET surface area of 5 to 500 m2/g which has been prepared by flame hydrolysis and has a titanium dioxide content of 0.5 to 20 wt. %, based on the powder, water and at least one pH-regulating substance which can be removed completely from the reaction mixture on heating, the aqueous dispersion having a solids content of between 40 and 80 wt. %. A green body produced therefrom with a green density of between 40 and 85%. A shaped glass article of optical quality with a coefficient of thermal expansion of not more than 0.5null10null6/K produced from the green body.

    摘要翻译： 含有BET表面积为5〜500m 2 / g的硅/钛混合氧化物粉末的水分散体，其通过火焰水解制备，二氧化钛含量为0.5〜20重量％。 ％，基于粉末，水和至少一种pH调节物质，其可以在加热时从反应混合物中完全除去，水分散体的固体含量为40-80重量％。 ％。 由其生产的生坯，其生坯密度在40％至85％之间。 由绿色体制成的具有不大于0.5×10 -6 / K的热膨胀系数的光学品质的成形玻璃制品。

    Method and system for thick-film deposition of ceramic materials
    5.
    发明申请
    Method and system for thick-film deposition of ceramic materials 失效
    陶瓷材料厚膜沉积的方法和系统

    公开(公告)号：US20020164432A1

    公开(公告)日：2002-11-07

    申请号：US09958705

    申请日：2001-10-09

    发明人： William Hofmeister

    IPC分类号： B05D001/02 ,  C23C004/10

    CPC分类号： C23C14/30 ,  C04B35/4508 ,  C04B35/62665 ,  C04B2235/3215 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3281 ,  C04B2235/3282 ,  C23C4/12 ,  C23C4/123 ,  C23C24/04

    摘要： A method of depositing a solid film on a substrate in which a stream comprising particles suspended in a transport gas is moved through a heating zone. The particles are combined with the transport gas from a powder feeder operatively coupled to a gas flow tube. The particle stream is directed toward the heating zone by ejecting the powder stream from a nozzle connected to a distal end of the gas flow tube. A radiation source is directed at the suspended particles as they move through the heating zone so that the particles heated to a molten state. The droplets are undercooled in a cooling zone before impact with the substrate.

    摘要翻译： 将固体膜沉积在基底上的方法，其中将包含悬浮在输送气体中的颗粒的物流移动通过加热区。 颗粒与来自可操作地耦合到气流管的粉末进料器的输送气体组合。 通过从连接到气体流管的远端的喷嘴喷射粉末流，将颗粒流引向加热区。 当悬浮颗粒移动通过加热区时，辐射源被引导到悬浮颗粒，使得颗粒被加热到熔融状态。 在与基底冲击之前，液滴在冷却区中过冷。

    Process for thermal plasma spraying of doped semiconductor oxide-based coatings
    7.
    发明申请
    Process for thermal plasma spraying of doped semiconductor oxide-based coatings 审中-公开
    掺杂半导体氧化物基涂层的热等离子喷涂工艺

    公开(公告)号：US20040146658A1

    公开(公告)日：2004-07-29

    申请号：US10732187

    申请日：2003-12-10

    申请人： CENTRO SVILUPPO MATERIALI S.P.A.

    发明人： Mario Tului

    IPC分类号： C23C004/10

    CPC分类号： C23C28/00 ,  C23C4/11 ,  F24S70/225

    摘要： A process for the preparation of a composite multilayer product with selective optical properties comprises the operation of depositing, by thermal plasma spraying of powders, a coating of semiconductor oxides doped with oxides of elements chosen from the group consisting of transition metals and metals in the groups III-A and V-A of the periodic table of elements, in which the coating obtained maintains the composition and doping of the thermal plasma sprayed powders substantially unchanged. The figure shows the X-ray diffraction spectrum of a coating deposited according to the process of the present invention.

    摘要翻译： 用于制备具有选择性光学性能的复合多层产品的方法包括通过热等离子体喷涂粉末沉积掺杂有选自过渡金属和组中的金属的元素的氧化物的半导体氧化物涂层的操作 元素周期表的III-A和VA，其中获得的涂层维持热等离子体喷涂粉末的组成和掺杂基本上不变。 该图示出了根据本发明的方法沉积的涂层的X射线衍射光谱。

    Sputtering targets and method for the preparation thereof
    8.
    发明申请
    Sputtering targets and method for the preparation thereof 审中-公开
    溅射靶及其制备方法

    公开(公告)号：US20020127349A1

    公开(公告)日：2002-09-12

    申请号：US10032901

    申请日：2001-10-19

    申请人： Rotar, Inc.

    发明人： Johan Emile Marle Vanderstraeten

    IPC分类号： C23C004/10

    CPC分类号： C23C14/3414 ,  C03C17/2456 ,  C03C2217/212 ,  C03C2218/154 ,  C23C4/11 ,  C23C4/134

    摘要： A process for the preparation of a sputtering target which comprises sub-stoichiometric titanium dioxide, TiOx, where x is below 2, having an electrical resistivity of less than 0.5 ohm.cm, optionally together with niobium oxide, which process comprises plasma spraying titanium dioxide, TiO2, optionally together with niobium oxide, onto a target base in an atmosphere which is oxygen deficient and which does not contain oxygen-containing compounds, the target base being coated with TiOx, which is solidified by cooling under conditions which prevent the sub-stoichiometric titanium dioxide from combining with oxygen.

    摘要翻译： 一种用于制备溅射靶的方法，其包括亚化学计量的二氧化钛TiO x，其中x低于2，电阻率小于0.5欧姆·厘米，任选地与氧化铌一起，该方法包括等离子体喷射二氧化钛 ，TiO 2，任选地与氧化铌一起，在氧缺乏且不含有氧的化合物的气氛中的靶基上，目标基底涂覆有TiO x，TiO x通过在防止副产物的条件下冷却而固化， 化学计量的二氧化钛与氧气结合。