发明申请
- 专利标题： Gas distribution showerhead
- 专利标题（中）： 燃气分配喷头
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申请号： US10674569申请日： 2003-09-29
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公开(公告)号： US20040060514A1公开(公告)日： 2004-04-01
- 发明人: Karthik Janakiraman , Nitin Ingle , Zheng Yuan , Steven Gianoulakis
- 申请人： APPLIED MATERIALS, INC. A Delaware corporation
- 申请人地址： CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC. A Delaware corporation
- 当前专利权人： APPLIED MATERIALS, INC. A Delaware corporation
- 当前专利权人地址： CA Santa Clara
- 主分类号： C23C016/00
- IPC分类号： C23C016/00
摘要：
A gas distribution showerhead is designed to allow deposition of uniformly thick films over a wide range of showerhead-to-wafer spacings. In accordance with one embodiment of the present invention, the number, width, and/or depth of orifices inlet to the faceplate are reduced in order to increase flow resistance and thereby elevate pressure upstream of the faceplate. This elevated upstream gas flow pressure in turn reduces variation in the velocity of gas flowed through center portions of the showerhead relative to edge portions, thereby ensuring uniformity in thickness of film deposited on the edge or center portions of the wafer.
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