发明申请
- 专利标题: Positive working thermal imaging assembly or structure, method for the manufacture thereof and products used as lithographic printing plates and the like
- 专利标题(中): 正性工作热成像组件或结构,其制造方法和用作平版印刷版的产品等
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申请号: US10726623申请日: 2003-12-04
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公开(公告)号: US20040152018A1公开(公告)日: 2004-08-05
- 发明人: Andre Luiz Arias , Luiz Nei Arias , Marjorie Arias , Mario Italo Provenzano
- 优先权: BRPI0102218-0 20010531
- 主分类号: G03F007/038
- IPC分类号: G03F007/038 ; G03F007/095 ; G03F007/16 ; G03F007/14
摘要:
The invention relates to Positive working thermal imaging assembly comprising: A) a substrate; and B) a thermally sensitive imaging element of a composite layer structure comprising: (i) a first layer on the substrate of a polymeric material soluble in aqueous alkali solution, optionally containing compounds that absorb and convert light to heat and/or a coloured dye or pigment; said first layer being converted at its surface by treatment with solutions at elevated temperatures that contain an active compound or compounds capable of rendering said first polymeric material insoluble to aqueous alkali developer at the point of contact ; the first layer being oleophilic; (ii) optionally, a first intermediate layer between the substrate and the said first layer with a second polymeric material which is soluble or dispersible in aqueous solution optionally containing compounds that absorb and convert light or radiation to heat and/or a coloured dye or pigment coated from a solvent that does not substantially dissolve the first layer; and (iii) optionally, a third or top layer over the converted first layer and composed of a second polymeric material which is soluble or dispersible in aqueous solution optionally containing compounds that absorb and convert light or radiation to heat and/or a visible coloured dye or pigment; the first intermediate layer and the third layer being applied with a solvent that does not substantially dissolve the converted first layer. The assembly is useful as off-set lithographic printing plates, for color proofing films and photoresist. The invention also refers to the process for making such assembly and products formed therefrom.
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