发明申请
- 专利标题： Polishing pad for electrochemical-mechanical polishing
- 专利标题（中）： 抛光垫用于电化学机械抛光
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申请号： US10601601申请日： 2003-06-23
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公开(公告)号： US20040259479A1公开(公告)日： 2004-12-23
- 发明人: Roland K. Sevilla
- 申请人： Cabot Microelectronics Corporation
- 申请人地址： IL Aurora
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 当前专利权人地址： IL Aurora
- 主分类号： B24B001/00
- IPC分类号： B24B001/00
摘要：
The invention provides a polishing pad comprising a body having a top surface comprising a first set of grooves with a first depth and first width and a bottom surface comprising a second set of grooves with a second depth and second width, wherein the first set of grooves and second set of grooves are interconnected and are oriented such that they are not aligned.
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