公开(公告)号：US20040259484A1

公开(公告)日：2004-12-23

申请号：US10463680

申请日：2003-06-17

Applicant: Cabot Microelectronics Corporation

Inventor： Abaneshwar Prasad ,  Roland K. Sevilla ,  Michael S. Lacy

IPC: B24B001/00

CPC classification number: B24B37/205 ,  B24D3/32

Abstract: The invention is directed to a multi-layer polishing pad for chemical-mechanical polishing comprising a polishing layer and a bottom layer, wherein the polishing layer and bottom layer are joined together without the use of an adhesive. The invention is also directed to a polishing pad comprising an optically transmissive multi-layer polishing pad material, wherein the layers of the polishing pad material are joined together without the use of an adhesive.

Abstract translation: 本发明涉及一种用于化学机械抛光的多层抛光垫，其包括抛光层和底层，其中抛光层和底层在不使用粘合剂的情况下连接在一起。 本发明还涉及一种包括光学透射多层抛光垫材料的抛光垫，其中抛光垫材料的层在不使用粘合剂的情况下连接在一起。

公开(公告)号：US20040259479A1

公开(公告)日：2004-12-23

申请号：US10601601

申请日：2003-06-23

Applicant: Cabot Microelectronics Corporation

Inventor： Roland K. Sevilla

IPC: B24B001/00

CPC classification number: B24B37/26 ,  B23H5/08 ,  B24B37/046

Abstract: The invention provides a polishing pad comprising a body having a top surface comprising a first set of grooves with a first depth and first width and a bottom surface comprising a second set of grooves with a second depth and second width, wherein the first set of grooves and second set of grooves are interconnected and are oriented such that they are not aligned.

Abstract translation: 本发明提供了一种抛光垫，其包括具有顶表面的主体，该顶表面包括具有第一深度和第一宽度的第一组凹槽，以及包括具有第二深度和第二宽度的第二组凹槽的底表面，其中第一组凹槽 并且第二组凹槽互连并且被定向成使得它们不对齐。