发明申请
- 专利标题: Bumping process
- 专利标题(中): 冲击过程
-
申请号: US10753316申请日: 2004-01-09
-
公开(公告)号: US20040266161A1公开(公告)日: 2004-12-30
- 发明人: Ching-Fu Horng
- 申请人: Advanced Semiconductor Engineering, Inc.
- 申请人地址: TW Kaoshiung
- 专利权人: Advanced Semiconductor Engineering, Inc.
- 当前专利权人: Advanced Semiconductor Engineering, Inc.
- 当前专利权人地址: TW Kaoshiung
- 优先权: TW092117867 20030630
- 主分类号: H01L021/44
- IPC分类号: H01L021/44 ; H01L021/4763 ; H01L021/48
摘要:
A method of forming a plurality of bumps over a wafer mainly comprises the steps of providing a wafer having a plurality of bonding pads, forming an adhesive layer on the surface of the wafer to cover the bonding pads, patterning the adhesive layer to expose the bonding pads to form a patterned adhesive layer, forming a barrier layer and a wetting layer on the patterned adhesive layer and the surface of the wafer, removing the barrier layer and the wetting layer not covering the patterned adhesive layer, forming a plurality of bumps on the patterned wetting layer, and reflowing the bumps.
公开/授权文献
- US07112523B2 Bumping process 公开/授权日:2006-09-26
信息查询