Invention Application
US20050000435A1 Reactor for producing reactive intermediates for low dielectric constant polymer thin films
审中-公开
用于生产低介电常数聚合物薄膜的反应性中间体的反应器
- Patent Title: Reactor for producing reactive intermediates for low dielectric constant polymer thin films
- Patent Title (中): 用于生产低介电常数聚合物薄膜的反应性中间体的反应器
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Application No.: US10900878Application Date: 2004-07-27
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Publication No.: US20050000435A1Publication Date: 2005-01-06
- Inventor: Chung Lee , Atul Kumar , Chieh Chen
- Applicant: Chung Lee , Atul Kumar , Chieh Chen
- Main IPC: B01J19/12
- IPC: B01J19/12 ; B01J19/18 ; B05D1/00 ; B05D3/02 ; B05D3/06 ; B05D7/24 ; B29C71/02 ; C08G61/02 ; C08J5/18 ; C08L65/00 ; C08L65/04 ; C23C16/452 ; F28D17/00 ; H01L21/312 ; H01L21/768 ; H01L23/532 ; C23C16/00
Abstract:
A reactor for forming a reactive intermediate from a precursor for the deposition of a low dielectric constant polymer film via transport polymerization is disclosed. The reactor includes an inlet for admitting a flow of the precursor into the reactor, an interior for converting the precursor to the reactive intermediate, an outlet for admitting a flow of the reactive intermediate out of the interior, and at least one of an energy source and an oxidant source associated with the outlet for decomposing residues in the outlet.
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