发明申请
US20050000454A1 Substrate handling system 有权
基材处理系统

Substrate handling system
摘要:
A substrate handling system and method in which an air chuck produces a film of air between the substrate and the air chuck, a magnetic chuck attracts the substrate to the air chuck, and an actuator subsystem moves the magnetic chuck closer to and away from the air chuck to alternately pick up a substrate and release the substrate.
公开/授权文献
信息查询
0/0