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公开(公告)号:US20050000454A1
公开(公告)日:2005-01-06
申请号:US10837842
申请日:2004-05-03
申请人: Norman Shaver , Timothy Ellis , David Hill
发明人: Norman Shaver , Timothy Ellis , David Hill
CPC分类号: B41C1/00 , B41C1/05 , B65H3/16 , B65H5/04 , B65H2301/44332 , B65H2406/11 , B65H2555/31 , B65H2701/1928 , Y10S414/141
摘要: A substrate handling system and method in which an air chuck produces a film of air between the substrate and the air chuck, a magnetic chuck attracts the substrate to the air chuck, and an actuator subsystem moves the magnetic chuck closer to and away from the air chuck to alternately pick up a substrate and release the substrate.
摘要翻译: 一种基板处理系统和方法,其中空气卡盘在基板和空气卡盘之间产生空气膜,磁卡盘将基板吸引到空气卡盘,并且致动器子系统使磁卡盘更靠近和远离空气 卡盘以交替地拾起基板并释放基板。
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公开(公告)号:US20050011382A1
公开(公告)日:2005-01-20
申请号:US10853539
申请日:2004-05-25
申请人: Joseph Donahue , Norman Shaver
发明人: Joseph Donahue , Norman Shaver
IPC分类号: B41C1/00 , G03B27/04 , G03C20060101 , G03F7/20
CPC分类号: G03F7/2022 , B41C1/00 , G03F7/2055
摘要: An integrated, in-line bumping and exposure system for printing plates or other substrates having a photosensitive layer. A linear illumination source or sources are for bumping the photosensitive material with a band of illumination to consume dissolved oxygen within the photosensitive layer. A raster scan optical assembly or an illuminated and re-imaged spatial light modulator array exposes the photosensitive material with a rasterized beam or beams or an array of modulated electromagnetic radiation located downstream of the bumping illumination. A conveyance mechanism is configured to provide relative continuous motion between one or more substrates and the bands of illumination to continuously bump and pattern one portion of the plate or plates while the other portion of the plate or plates is bumped in anticipation of patterning.
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