Invention Application
- Patent Title: Electron microscopy system, electron microscopy method and focusing system for charged particles
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Application No.: US10825240Application Date: 2004-04-16
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Publication No.: US20050006582A1Publication Date: 2005-01-13
- Inventor: Michael Steigerwald , Erik Essers
- Applicant: Michael Steigerwald , Erik Essers
- Applicant Address: DE Oberkochen
- Assignee: LEO Elektronenmikroskopie GmbH
- Current Assignee: LEO Elektronenmikroskopie GmbH
- Current Assignee Address: DE Oberkochen
- Priority: DE10317894.5 20030417
- Main IPC: G01Q30/02
- IPC: G01Q30/02 ; H01J37/05 ; H01J37/12 ; H01J37/153 ; H01J37/28 ; G01N23/00

Abstract:
An electron microscopy system and an electron microscopy method for detection of time dependencies of secondary electrons generated by primary electrons is provided, in which the primary electron pulses are directed onto a sample surface and electrons emanating from the sample surface are detected, time resolved. To this end the system comprises in particular a cavity resonator. A cavity resonator can also be used to reduce aberrations of focusing lenses.
Public/Granted literature
- US06949744B2 Electron microscopy system, electron microscopy method and focusing system for charged particles Public/Granted day:2005-09-27
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