发明申请
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10850567申请日： 2004-05-21
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公开(公告)号： US20050012916A1公开(公告)日： 2005-01-20
- 发明人: Karel Van Der Mast , Arno Bleeker , Cheng-Qun Gui , Johan Hoefnagels
- 申请人： Karel Van Der Mast , Arno Bleeker , Cheng-Qun Gui , Johan Hoefnagels
- 优先权： EP03253213.7 20030522
- 主分类号： G02B3/00
- IPC分类号： G02B3/00 ; G03F7/20 ; H01L21/027 ; G03B27/54
摘要：
A lithographic projection apparatus comprises a microlens array for generating a plurality of source images in a two-dimensional array, a programmable patterning means having a plurality of addressable elements acting as shutters for the source images and a projection subsystem for projecting a n image of the array of source images onto a substrate. A greater working distance can thereby be obtained
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