发明申请
US20050023254A1 Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
有权
等离子体处理装置，电极单元，馈线构件和射频馈线棒
- 专利标题： Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
- 专利标题（中）： 等离子体处理装置，电极单元，馈线构件和射频馈线棒
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申请号： US10927587申请日： 2004-08-27
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公开(公告)号： US20050023254A1公开(公告)日： 2005-02-03
- 发明人: Daisuke Hayashi , Kazuya Nagaseki , Shinji Himori , Atsushi Matsuura , Ryo Nonaka
- 申请人： Daisuke Hayashi , Kazuya Nagaseki , Shinji Himori , Atsushi Matsuura , Ryo Nonaka
- 优先权： JP2002-054202 20020228; JP2002-054225 20020228; JP2002-085303 20020326; JP2003-006943 20030115
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; B23K10/00
摘要：
The present invention relates to a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a plasma process to an object to be processed arranged in the processing container. The plasma processing apparatus of the present invention includes: an electrode unit arranged in the processing container, the electrode unit having an electrode for applying the radio frequency power, and a space portion arranged in the electrode unit, the space portion insulating the electrode and the processing container from each other. The space portion is communicated with an atmospheric air outside the processing container.
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