Invention Application
- Patent Title: Fullerenes to increase radiation resistance in polymer-based pellicles
- Patent Title (中): 富勒烯增加聚合物薄膜中的耐辐射性
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Application No.: US10403963Application Date: 2003-03-31
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Publication No.: US20050029126A1Publication Date: 2005-02-10
- Inventor: Alexander Tregub , Tim Chen , Susan Holl
- Applicant: Alexander Tregub , Tim Chen , Susan Holl
- Main IPC: G01F1/64
- IPC: G01F1/64 ; G01N27/26 ; G03F1/14
Abstract:
A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.
Public/Granted literature
- US07288299B2 Fullerenes to increase radiation resistance in polymer-based pellicles Public/Granted day:2007-10-30
Information query
