发明申请
- 专利标题： Chemical supply system
- 专利标题（中）： 化学供应系统
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申请号： US10849836申请日： 2004-05-21
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公开(公告)号： US20050045207A1公开(公告)日： 2005-03-03
- 发明人: Takahisa Nitta , Nobuhiro Miki , Yoshiaki Yamaguchi
- 申请人： Takahisa Nitta , Nobuhiro Miki , Yoshiaki Yamaguchi
- 申请人地址： JP Tokyo
- 专利权人： Sipec Corporation
- 当前专利权人： Sipec Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP10-319035 19981110; JP11-7063 19990113; JP11-316244 19991108
- 主分类号： H01L21/304
- IPC分类号： H01L21/304 ; B01F5/04 ; B01F5/12 ; B01F15/02 ; B01F15/04 ; B01J4/02 ; F04B13/02 ; F04B43/00 ; F04B43/02 ; F04B43/04 ; F04F7/00 ; F16K7/12 ; G05D11/13 ; B08B3/02
摘要：
A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.
公开/授权文献
- US07195024B2 Chemical supply system 公开/授权日：2007-03-27
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