Invention Application
- Patent Title: DYNAMIC RANDOM ACCESS MEMORY AND FABRICATION THEREOF
- Patent Title (中): 动态随机存取存储器及其制造方法
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Application No.: US10711939Application Date: 2004-10-14
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Publication No.: US20050048711A1Publication Date: 2005-03-03
- Inventor: Ting-Shing Wang
- Applicant: Ting-Shing Wang
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/8238 ; H01L21/8242 ; H01L21/8244 ; H01L27/108 ; H01L29/76 ; H01L29/94

Abstract:
A dynamic random access memory (DRAM) cell is described, including a semiconductor pillar on a substrate, a capacitor on a lower portion of a sidewall of the pillar, and a vertical transistor on an upper portion of the sidewall of the pillar. The capacitor includes a first plate in the lower portion of the sidewall of the pillar, a second plate as an upper electrode at the periphery of the first plate, a third plate at the periphery of the second plate electrically connected with the first plate to form a lower electrode, and a dielectric layer separating the second plate from the first and third plates. A DRAM array based on the DRAM cell and a method for fabricating the DRAM array are also described.
Public/Granted literature
- US07119390B2 Dynamic random access memory and fabrication thereof Public/Granted day:2006-10-10
Information query
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