发明申请
US20050053536A1 Method and apparatus for treating waste gas containing acid and/or base
审中-公开
用于处理含酸和/或碱的废气的方法和装置
- 专利标题: Method and apparatus for treating waste gas containing acid and/or base
- 专利标题(中): 用于处理含酸和/或碱的废气的方法和装置
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申请号: US10856064申请日: 2004-05-28
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公开(公告)号: US20050053536A1公开(公告)日: 2005-03-10
- 发明人: Hung Chein , Hsin-Hsien Wu , Shankar Aggarwal , Chuen-Jinn Tsai
- 申请人: Hung Chein , Hsin-Hsien Wu , Shankar Aggarwal , Chuen-Jinn Tsai
- 优先权: TW92124567 20030905
- 主分类号: B01D53/14
- IPC分类号: B01D53/14 ; B01D53/40 ; B01J8/00
摘要:
A method for treating waste gas containing acid and/or base, employing fine spray-scrubbing technology for treating the waste gas mentioned above, wherein the scrubbing solution is atomized to generate mists with droplet size of 1 to 100 μm. Another feature of the present invention is to combine the application of surfactant in wet scrubbing technology for treating waste gas containing acids, bases, or both, especially, in a low concentration. Another feature of the present invention is to combine spray tower and/or packed tower and/or other scrubbers vertically/horizontally to get enhanced performance of the conventional control systems.
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