Invention Application
- Patent Title: Overlay registration control system and method employing multiple pilot lot in-line overlay registration measurement
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Application No.: US10656757Application Date: 2003-09-06
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Publication No.: US20050055122A1Publication Date: 2005-03-10
- Inventor: To-Nien Lin , Kuan-Luan Cheng , Kun-Pi Cheng , Hsin-Yuan Chen
- Applicant: To-Nien Lin , Kuan-Luan Cheng , Kun-Pi Cheng , Hsin-Yuan Chen
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.,
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.,
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06F7/00 ; G06F19/00 ; H01L21/00
Abstract:
A method for fabricating a microelectronic product and a system for fabricating the microelectronic product each employ an in-line automatic photolithographic processing and overlay registration measurement for a pair of pilot lots of a new product order, prior to in-line automatic processing of an additional new product order lot within a photolithographic process tool. The method and the system provide for efficient production of new product order lots, absent need for an independent pilot lot qualification method or system.
Public/Granted literature
Information query
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