发明申请
- 专利标题: Semiconductor device and manufacturing method thereof
- 专利标题(中): 半导体装置及其制造方法
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申请号: US10786097申请日: 2004-02-26
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公开(公告)号: US20050056897A1公开(公告)日: 2005-03-17
- 发明人: Masahiro Kawasaki , Shuji Imazeki , Masahiko Ando
- 申请人: Masahiro Kawasaki , Shuji Imazeki , Masahiko Ando
- 优先权: JP2003-321870 20030912
- 主分类号: H01L51/05
- IPC分类号: H01L51/05 ; H01L23/62 ; H01L29/786 ; H01L51/00 ; H01L51/30
摘要:
An object of the present invention is to provide a semiconductor device such as a display device, ID tag, sensor or the like at low cost by using a bottom contact type organic TFT as a switching element. In the present invention, the semiconductor layer of the bottom contact type organic TFT is formed of a polycrystalline material, and the taper width of each of the source and drain electrodes of the TFT in the direction of the channel length is smaller than the average particle size of semiconductor crystals grown on the source and drain electrodes. Alternatively, the side on the channel side of each of the source and drain electrodes of the bottom contact type organic TFT is formed so as to be convex upward with respect to the substrate surface. Alternatively, an organic compound layer different from the semiconductor layer of the bottom contact type organic TFT is made present between each of the source and drain electrodes of the bottom contact type organic TFT and said semiconductor layer, in a thickness of not more than 10 Å and not less than 1 Å.
公开/授权文献
- US07081641B2 Semiconductor device and manufacturing method thereof 公开/授权日:2006-07-25
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