发明申请
US20050061658A1 Dual magnetic tunnel junction sensor with a longitudinal bias stack
有权
具有纵向偏置叠层的双磁性隧道结传感器
- 专利标题: Dual magnetic tunnel junction sensor with a longitudinal bias stack
- 专利标题(中): 具有纵向偏置叠层的双磁性隧道结传感器
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申请号: US10981926申请日: 2004-11-05
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公开(公告)号: US20050061658A1公开(公告)日: 2005-03-24
- 发明人: Tsann Lin , Daniele Mauri
- 申请人: Tsann Lin , Daniele Mauri
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 主分类号: G01R33/09
- IPC分类号: G01R33/09 ; G11B5/39 ; G11B5/127 ; B05D3/02 ; C23C14/00
摘要:
A dual magnetic tunnel junction (MTJ) sensor is provided with a longitudinal bias stack sandwiched between a first MTJ stack and a second MTJ stack. The longitudinal bias stack comprises an antiferromagnetic (AFM) layer sandwiched between first and second ferromagnetic layers. The first and second MTJ stacks comprise antiparallel (AP)-pinned layers pinned by AFM layers made of an AFM material having a higher blocking temperature than the AFM material of the bias stack allowing the AP-pinned layers to be pinned in a transverse direction and the bias stack to be pinned in a longitudinal direction. The demagnetizing fields of the two AP-pinned layers cancel each other and the bias stack provides flux closures for the sense layers of the first and second MTJ stacks.
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