发明申请
- 专利标题: Electrodeposition device and electrodeposition system for coating structures which have already been made conductive
- 专利标题(中): 用于已经导电的涂层结构的电沉积装置和电沉积系统
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申请号: US10916308申请日: 2004-08-11
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公开(公告)号: US20050061661A1公开(公告)日: 2005-03-24
- 发明人: Andreas Muller-Hipper , Ewald Simmerlein-Erlbacher , Andreas Karl
- 申请人: Andreas Muller-Hipper , Ewald Simmerlein-Erlbacher , Andreas Karl
- 申请人地址: DE Munich
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Munich
- 优先权: DE10153056.0 20011025; DE10234705.0 20020730
- 主分类号: C25D5/18
- IPC分类号: C25D5/18 ; C25D7/06 ; H05K1/00 ; H05K3/24 ; C25D17/00
摘要:
Electrodeposition device for electrodepositing an electrically conductive layer on a substrate having an electrolyte bath in which an anode device and at least one contact-making unit are arranged, each contact-making unit having a plurality of electrically conductive regions of which at least one is connected cathodically and at least one is connected anodically.
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