发明申请
US20050064322A1 Water and aqueous base soluble antireflective coating/hardmask materials
有权
水和水性可溶性抗反射涂层/硬掩模材料
- 专利标题： Water and aqueous base soluble antireflective coating/hardmask materials
- 专利标题（中）： 水和水性可溶性抗反射涂层/硬掩模材料
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申请号： US10666541申请日： 2003-09-19
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公开(公告)号： US20050064322A1公开(公告)日： 2005-03-24
- 发明人: Katherina Babich , Alfred Grill , Arpan Mahorowala , Dirk Pfeiffer
- 申请人： Katherina Babich , Alfred Grill , Arpan Mahorowala , Dirk Pfeiffer
- 主分类号： G03C1/76
- IPC分类号： G03C1/76 ; G03F7/075 ; G03F7/09 ; G03F7/11 ; G03F7/16
摘要：
A multilayer lithographic structure which includes a substrate, having on a major surface thereof a first layer including a water and/or aqueous base soluble material which includes Ge, O, and H, and optionally X, wherein X is at least one of Si, N, and F; and disposed on the first layer a second layer which includes an energy photoactive material.
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