Invention Application
US20050068644A1 Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method
有权
用于光学构件的合成石英玻璃，投影曝光装置和投影曝光方法
- Patent Title: Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method
- Patent Title (中): 用于光学构件的合成石英玻璃，投影曝光装置和投影曝光方法
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Application No.: US10969954Application Date: 2004-10-22
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Publication No.: US20050068644A1Publication Date: 2005-03-31
- Inventor: Yoshiaki Ikuta , Noriyuki Agata
- Applicant: Yoshiaki Ikuta , Noriyuki Agata
- Applicant Address: JP Tokyo
- Assignee: ASAHI GLASS COMPANY, LIMITED
- Current Assignee: ASAHI GLASS COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2002-120805 20020423
- Main IPC: C03C3/06
- IPC: C03C3/06 ; G02B1/02 ; G03F7/20 ; G02B5/04
Abstract:
A synthetic quartz glass for an optical member, which is to be used in an optical device employing an ArF excimer laser beam as a light source at an energy density of at most 2 mJ/cm2/pulse or in an optical device employing a KrF excimer laser beam as a light source at an energy density of at most 30 mJ/cm2/pulse, characterized in that the hydrogen molecule concentration is within a range of at least 1×1016 molecules/cm3 and less than 5×1016 molecules/cm3.
Public/Granted literature
- US07368403B2 Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method Public/Granted day:2008-05-06
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