Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method
    1.
    发明授权
    Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method 有权
    用于光学构件的合成石英玻璃,投影曝光装置和投影曝光方法

    公开(公告)号:US07368403B2

    公开(公告)日:2008-05-06

    申请号:US10969954

    申请日:2004-10-22

    IPC分类号: C03C3/06

    摘要: A synthetic quartz glass for an optical member, which is to be used in an optical device employing an ArF excimer laser beam as a light source at an energy density of at most 2 mJ/cm2/pulse or in an optical device employing a KrF excimer laser beam as a light source at an energy density of at most 30 mJ/cm2/pulse, characterized in that the hydrogen molecule concentration is within a range of at least 1×1016 molecules/cm3 and less than 5×1016 molecules/cm3.

    摘要翻译: 一种用于光学构件的合成石英玻璃,其用于以能量密度为至多2mJ / cm 2 /脉冲的ArF准分子激光束作为光源的光学装置,或 在使用KrF准分子激光束作为光源的能量密度为至多30mJ / cm 2 /脉冲的光学装置中,其特征在于,所述氢分子浓度在至少 1×10 16分子/ cm 3和小于5×10 16分子/ cm 3。

    Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method
    2.
    发明申请
    Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method 有权
    用于光学构件的合成石英玻璃,投影曝光装置和投影曝光方法

    公开(公告)号:US20050068644A1

    公开(公告)日:2005-03-31

    申请号:US10969954

    申请日:2004-10-22

    摘要: A synthetic quartz glass for an optical member, which is to be used in an optical device employing an ArF excimer laser beam as a light source at an energy density of at most 2 mJ/cm2/pulse or in an optical device employing a KrF excimer laser beam as a light source at an energy density of at most 30 mJ/cm2/pulse, characterized in that the hydrogen molecule concentration is within a range of at least 1×1016 molecules/cm3 and less than 5×1016 molecules/cm3.

    摘要翻译: 一种用于光学构件的合成石英玻璃,其用于使用ArF准分子激光束作为能量密度为至多2mJ / cm 2 /脉冲的光源的光学装置中,或者在采用 KrF准分子激光束作为能量密度为至多30mJ / cm 2 /脉冲的光源,其特征在于氢分子浓度在至少1×10 16分子/ cm 3的范围内 和小于5×10 16分子/ cm 3。

    Synthetic quartz glass for optical member and its production method
    3.
    发明授权
    Synthetic quartz glass for optical member and its production method 有权
    光学构件合成石英玻璃及其制作方法

    公开(公告)号:US07514382B2

    公开(公告)日:2009-04-07

    申请号:US11398669

    申请日:2006-04-06

    IPC分类号: C03C3/06 C03B20/00

    摘要: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

    摘要翻译: 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃,其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件,其基本上不含氧过剩缺陷,溶解氧分子或还原型 其浓度最多为50ppm,OH基浓度为100ppm以下,含有缺氧缺陷量为5×1014个/ cm 3以下且至少1×10 13个缺陷/ cm 3以下的缺陷缺陷。 氟浓度优选为100ppm以下。

    Synthetic quartz glass for optical member and its production method
    4.
    发明申请
    Synthetic quartz glass for optical member and its production method 有权
    光学构件合成石英玻璃及其制作方法

    公开(公告)号:US20060183623A1

    公开(公告)日:2006-08-17

    申请号:US11398669

    申请日:2006-04-06

    IPC分类号: C03C3/06 C03B37/07 C03B37/018

    摘要: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

    摘要翻译: 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃,其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件,其基本上不含氧过剩缺陷,溶解氧分子或还原型 缺陷,其氯浓度最多为50ppm,OH基浓度为至多100ppm,并且其含有缺氧缺陷的浓度范围至多为5×10 14个/ cm 2以下 > 3%和至少1×10 3个缺陷/ cm 3。 氟浓度优选为100ppm以下。