公开(公告)号：US08580465B2

公开(公告)日：2013-11-12

申请号：US13443108

申请日：2012-04-10

申请人： Masaki Mikami ,  Mitsuhiko Komakine ,  Yoshiaki Ikuta

发明人： Masaki Mikami ,  Mitsuhiko Komakine ,  Yoshiaki Ikuta

IPC分类号： G03F1/24

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70958 ,  G03F7/70983

摘要： Provided are a multilayer mirror for EUVL in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, and a process for its production. A multilayer mirror for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer.

摘要翻译： 提供一种用于EUVL的多层反射镜，其中防止了由Ru保护层的氧化引起的反射率的劣化，以及其制备方法。 一种用于EUV光刻的多层反射镜，其包括基板，以及用于反射EUV光的反射层和用于保护反射层的保护层，其依次形成在基板上，其中反射层为Mo / Si多层反射膜， 保护层是Ru层或Ru化合物层，并且在反射层和保护层之间形成含有0.5〜25原子％的氮和75〜99.5原子％的Si的中间层。

公开(公告)号：US08470968B2

公开(公告)日：2013-06-25

申请号：US13243259

申请日：2011-09-23

申请人： Yasuharu Nishimura ,  Yoshiaki Ikuta ,  Shuichi Nakatsuru

发明人： Yasuharu Nishimura ,  Yoshiaki Ikuta ,  Shuichi Nakatsuru

IPC分类号： A61K38/08

CPC分类号： C07K7/06 ,  A61K38/00 ,  A61K39/0011 ,  A61K2039/5154 ,  C07K14/47 ,  C07K16/18

摘要： It is an objective of the present invention to identify SPARC protein-derived peptides that are able to induce human killer T cells and helper T cells having cytotoxic activity to tumors, and to provide a means for carrying out a tumor immunotherapy of patients with various types of cancers overexpressing SPARC. The present invention provides a peptide of any of the following: (A) a peptide which consists of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3; or (B) a peptide which consists of an amino acid sequence comprising a substitution or addition of one or several amino acids with respect to the peptide consisting of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3, and which has capacity to induce cytotoxic (killer) T cells.

公开(公告)号：US08052797B2

公开(公告)日：2011-11-08

申请号：US11552269

申请日：2006-10-24

申请人： Yoshiaki Ikuta

发明人： Yoshiaki Ikuta

IPC分类号： B08B3/04 ,  B08B3/08

CPC分类号： H01L21/02054 ,  C03C15/00 ,  C03C23/0005 ,  C03C23/0075 ,  G03F1/82

摘要： A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which includes applying a light beam in a wavelength range which makes the light absorption coefficient of at least one of a material of the substrate, a material of the inorganic coating and the inorganic foreign matters be at least 0.01/cm, to the surface of the substrate or to the surface of the inorganic coating in an application amount of at least 10 J/cm2 in an oxygen- or ozone-containing atmosphere, and exposing the surface of the substrate or the surface of the inorganic coating having a negative surface potential to an acidic solution having a pH ≦6.

摘要翻译： 一种从硅或玻璃制成的基板的表面除去无机异物的方法或在基板的表面上形成的无机涂层的表面，该方法包括在使光吸收系数为 所述基材的材料，所述无机涂层的材料和所述无机异物中的至少一种与所述基材的表面或所述无机涂层的表面的比例为至少0.01 / cm，涂布量为至少10 在含氧气体或含臭氧的气氛中的J / cm 2，并将具有负表面电位的基底表面或无机涂层的表面暴露于pH

公开(公告)号：US07960077B2

公开(公告)日：2011-06-14

申请号：US12694860

申请日：2010-01-27

申请人： Yoshiaki Ikuta ,  Toshiyuki Uno ,  Ken Ebihara

发明人： Yoshiaki Ikuta ,  Toshiyuki Uno ,  Ken Ebihara

IPC分类号： G03F1/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/38 ,  G03F1/40 ,  G03F7/70708 ,  G21K2201/067 ,  Y10T428/31616

摘要： A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer.

摘要翻译： 一种用于EUV光刻的反射掩模板，包括具有前表面和后表面的基板，形成在基板的前表面上的反射层，形成在反射层上的吸收层，以及形成在反射层的后表面上的夹持层 基板并定位成将基板夹持到静电卡盘。 衬底具有不导电部分，其消除了反射层和夹持层之间的电传导以及吸收层和夹持层之间的电传导，并且非导电部分通过形成覆盖有一个衬底的衬底的一部分而形成 或更多的覆盖构件，并且防止反射层和吸收层的形成。

公开(公告)号：US07694797B2

公开(公告)日：2010-04-13

申请号：US10821736

申请日：2004-04-09

申请人： Hisashi Takeuchi ,  Yoshiaki Ikuta ,  Masao Sakamoto ,  Hirokazu Goto ,  Masaru Hayasako

发明人： Hisashi Takeuchi ,  Yoshiaki Ikuta ,  Masao Sakamoto ,  Hirokazu Goto ,  Masaru Hayasako

IPC分类号： G07F7/04

CPC分类号： G07D11/0066 ,  G06Q20/382 ,  G06Q20/40 ,  G07D11/009

摘要： A printed note deposit machine, comprises: a user recognition unit identifying a user with an authenticated person; an inlet unit serving as a receiving teller in which printed notes are deposited; a dispensing unit receiving printed notes deposited in the inlet unit to dispense them in sequence; an identifying unit classifying the dispensed printed notes into four categories of authenticated notes, counterfeit notes, unidentifiable notes, and rejected notes, and identified them with the four categories; a temporary money holder temporarily storing the authenticated, counterfeit, and unidentified notes but the rejected ones therein; a plurality of storage cells storing the printed notes after they are temporarily stored in the previous stage; and a rejection unit accumulating the printed notes identified with the rejected notes by the identifying unit to return them to the user. A printed note deposit system, comprises: a plurality of the printed note deposit machines; a database apparatus installed in a central office and receiving transaction data from the memory of each of the printed note deposit machines to accumulate the transaction data; and a trace unit matching the transaction data accumulated in the database apparatus with transaction data on the detected counterfeit or unidentified notes to track down a user of the unauthenticated notes.

摘要翻译： 一种印刷笔记存款机，包括：用户识别单元，用于识别具有认证人的用户; 入口单元，用作存放打印纸的接收柜员; 分配单元，其接收沉积在入口单元中以便依次分配它们的印记; 识别单元将分发的印刷纸分类为四类认证纸币，假币，不可识别纸币和拒收纸币，并用四类进行鉴定; 临时存款人暂时存放经认证的，伪造的和不明的票据，但其中的被拒绝的票据; 多个存储单元在其被暂时存储在前一级之后存储打印的笔记; 以及拒绝单元，累积由所述识别单元识别的被拒绝的笔记的打印笔记，以将其返回给用户。 一种印刷纸币存款系统，包括：多个印刷纸币存款机; 数据库装置，安装在中心局，并从每个打印的笔记存放机的存储器接收交易数据，以累积交易数据; 以及跟踪单元，其与在数据库装置中累积的交易数据相匹配的检测到的假冒或未识别的笔记上的交易数据跟踪未认证笔记的用户。

公开(公告)号：US07549141B2

公开(公告)日：2009-06-16

申请号：US11222979

申请日：2005-09-12

申请人： Yoshiaki Ikuta ,  Hiroshi Kojima ,  Kouji Otsuka

发明人： Yoshiaki Ikuta ,  Hiroshi Kojima ,  Kouji Otsuka

IPC分类号： G06F17/50

CPC分类号： G03F7/707 ,  G03F1/60 ,  G03F7/703 ,  G03F7/70783

摘要： A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.

摘要翻译： 通过包括提供具有要在其上形成预定图案的表面的基板的方法制造光掩模，将基板定位在曝光工具中，以便获得由于施加在其上的外力而导致的表面的变形量 基板，基于所述表面的变形量和目标平面度来计算所述表面的目标轮廓，以及当所述基板位于所述曝光工具中时，对所述基板的表面进行处理，以使所述表面基本上平坦。

公开(公告)号：US20090111095A1

公开(公告)日：2009-04-30

申请号：US11577435

申请日：2005-08-09

申请人： Yasuharu Nishimura ,  Tetsuya Nakatsura ,  Yoshiaki Ikuta

发明人： Yasuharu Nishimura ,  Tetsuya Nakatsura ,  Yoshiaki Ikuta

IPC分类号： C12Q1/68 ,  C07K16/18

CPC分类号： G01N33/5743 ,  G01N2333/4722 ,  G01N2333/4727

摘要： The object of the present invention is to find out another tumor marker which is useful for early diagnosis of melanoma, and provide a diagnostic kit and diagnostic method for malignant melanoma using such marker. The present invention provides a diagnostic kit for malignant melanoma, which comprises an antibody against SPARC and an antibody against GPC3.

摘要翻译： 本发明的目的是找出可用于黑色素瘤早期诊断的另一种肿瘤标志物，并提供使用这种标记物的恶性黑素瘤的诊断试剂盒和诊断方法。 本发明提供了用于恶性黑素瘤的诊断试剂盒，其包含针对SPARC的抗体和针对GPC3的抗体。

公开(公告)号：US07514382B2

公开(公告)日：2009-04-07

申请号：US11398669

申请日：2006-04-06

申请人： Yoshiaki Ikuta ,  Noriyuki Agata

发明人： Yoshiaki Ikuta ,  Noriyuki Agata

IPC分类号： C03C3/06 ,  C03B20/00

CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  Y02P40/57

摘要： A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

摘要翻译： 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解氧分子或还原型 其浓度最多为50ppm，OH基浓度为100ppm以下，含有缺氧缺陷量为5×1014个/ cm 3以下且至少1×10 13个缺陷/ cm 3以下的缺陷缺陷。 氟浓度优选为100ppm以下。

公开(公告)号：US20080057291A1

公开(公告)日：2008-03-06

申请号：US11514997

申请日：2006-09-05

申请人： Yoshiaki Ikuta ,  Shinya Kikugawa

发明人： Yoshiaki Ikuta ,  Shinya Kikugawa

IPC分类号： B32B3/00

CPC分类号： C03B19/1453 ,  C03B2201/03 ,  C03B2201/12 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  Y10T428/166 ,  Y10T428/249969 ,  Y10T428/252

摘要： For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface.The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

摘要翻译： 对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度，并且使石英玻璃基板的表面的蚀刻速率均匀，由此， 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。

公开(公告)号：US20070295355A1

公开(公告)日：2007-12-27

申请号：US11471505

申请日：2006-06-21

申请人： Yoshiaki Ikuta

发明人： Yoshiaki Ikuta

IPC分类号： B08B3/12 ,  H01L21/306

CPC分类号： H01L21/67028 ,  H01L21/67115

摘要： To provide a method and apparatus for cleaning a substrate to effectively remove an organic type or metallic type contaminant from a to-be-cleaned surface of a substrate by an increase in the intensity of UV light at the to-be-cleaned surface of the substrate and by an increase in the concentration of ozone O3, excited state oxygen atoms O(1D) and active oxygen.A method for cleaning a substrate by means of irradiation with UV light, wherein a second space containing a surface on the side of the substrate on which the cleaning is to be carried out (hereinafter referred to as the to-be-cleaned surface) and its vicinity, is an atmosphere comprising a gas or a liquid which generates at least one of ozone, excited state oxygen atoms and active oxygen species by the irradiation with the UV light, a first space containing a surface on the other side of the substrate (hereinafter referred to as the to-be-irradiated surface) is an atmosphere comprising a gas showing a low absorption of the UV light, and the UV light is permitted to enter via the first space into the to-be-irradiated surface of the substrate, then pass through the interior of the substrate and then be applied to the to-be-cleaned surface.

摘要翻译： 为了提供一种用于清洁基底的方法和装置，以通过增加待清洁的表面上的UV光的强度来有效地从基底的待清洁表面去除有机类型或金属型污染物 底物和臭氧O 3浓度的增加，激发态氧原子O（1D）和活性氧。 一种通过紫外线照射来清洗基板的方法，其中包含要在其上进行清洁的基板的一侧上的表面的第二空间（以下称为待清洁表面）和 其附近是包含通过照射紫外光而产生臭氧，激发态氧原子和活性氧中的至少一种的气体或液体的气氛，包含基板另一侧的表面的第一空间（ 以下称为待照射面）是包含显示紫外光吸收低的气体的气氛，并且允许UV光经由第一空间进入基板的被照射表面 ，然后通过基板的内部，然后施加到待清洁的表面。