发明申请
- 专利标题: Write pole fabrication for perpendicular recording
- 专利标题(中): 写极柱制作用于垂直记录
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申请号: US10672896申请日: 2003-09-26
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公开(公告)号: US20050068665A1公开(公告)日: 2005-03-31
- 发明人: Quang Le , Edward Pong Lee , Jiu-Lung Li , Aron Pentek , Nian-Xiang Sun
- 申请人: Quang Le , Edward Pong Lee , Jiu-Lung Li , Aron Pentek , Nian-Xiang Sun
- 专利权人: HITACHI GLOBAL STORAGE TECHNOLOGIES
- 当前专利权人: HITACHI GLOBAL STORAGE TECHNOLOGIES
- 主分类号: G11B5/012
- IPC分类号: G11B5/012 ; G11B5/11 ; G11B5/127 ; G11B5/33
摘要:
A method and materials to fabricate a trailing shield write pole that resolve the problems of controlling the write gap and preventing damages to the write gap or pole during fabrication of the subsequent structure. This process also introduces a CMP assisted lift-off process to remove re-deposition and fencing (increase yields) and a method to create dishing in the top of the write pole. Moreover, also included in this disclosure are suitable materials that can function as an ion mill transfer layer, CMP layer, and RIEable layer.
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