Invention Application
- Patent Title: Reflection mirror apparatus, exposure apparatus and device manufacturing method
- Patent Title (中): 反射镜装置,曝光装置和装置的制造方法
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Application No.: US10647376Application Date: 2003-08-26
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Publication No.: US20050073663A1Publication Date: 2005-04-07
- Inventor: Yoshikazu Miyajima
- Applicant: Yoshikazu Miyajima
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Priority: JP2002-191282 20020628
- Main IPC: G02B5/10
- IPC: G02B5/10 ; G02B17/00 ; G03F7/20 ; G21K1/06 ; H01L21/027 ; G03B27/52

Abstract:
A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.
Public/Granted literature
- US07349063B2 Reflection mirror apparatus, exposure apparatus and device manufacturing method Public/Granted day:2008-03-25
Information query