Invention Application
- Patent Title: Integrated implant monitor for closed loop control
- Patent Title (中): 用于闭环控制的综合植入物监测器
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Application No.: US10894357Application Date: 2004-07-19
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Publication No.: US20050074909A1Publication Date: 2005-04-07
- Inventor: Kenneth Steeples
- Applicant: Kenneth Steeples
- Applicant Address: US MA North Billerica
- Assignee: QC Solutions, Inc.
- Current Assignee: QC Solutions, Inc.
- Current Assignee Address: US MA North Billerica
- Main IPC: H01J37/304
- IPC: H01J37/304 ; H01J37/317 ; H01L21/00 ; H01L21/04 ; H01L21/66
Abstract:
The invention relates to a method and apparatus for real-time in-situ implantation and measurement incorporating a feedback loop to adjust the implantation dose of a substrate during the manufacturing and testing of semiconductor wafers. During processing, the substrate, such as a silicon wafer, is transported between a measuring device and an implantation device multiple times to ensure that where the beam from the implantation device hits the substrate, the doping concentration falls within the range of desired parameters.
Public/Granted literature
- US07160742B2 Methods for integrated implant monitoring Public/Granted day:2007-01-09
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