发明申请
- 专利标题： Process monitoring device for sample processing apparatus and control method of sample processing apparatus
- 专利标题（中）： 样品处理装置的过程监控装置和样品处理装置的控制方法
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申请号： US10987121申请日： 2004-11-15
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公开(公告)号： US20050090914A1公开(公告)日： 2005-04-28
- 发明人: Junichi Tanaka , Hiroyuki Kitsunai , Hideyuki Yamamoto , Shoji Ikuhara , Kazue Takahashi
- 申请人： Junichi Tanaka , Hiroyuki Kitsunai , Hideyuki Yamamoto , Shoji Ikuhara , Kazue Takahashi
- 优先权： JP2001-060995 20010305
- 主分类号： H01L21/205
- IPC分类号： H01L21/205 ; G05B23/02 ; H01L21/00 ; H01L21/02 ; G05B11/01 ; G05B15/00 ; G05B21/02
摘要：
A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.
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