公开(公告)号：US20070162172A1

公开(公告)日：2007-07-12

申请号：US11645680

申请日：2006-12-27

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： G06F19/00

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A plasma processing method for processing a sample by using plasma on a lot unit basis, including: detecting plural kinds of information as monitor data relating to a processing state of the sample, using a plurality of sensors; selecting a detection time range of the monitor data thus detected; converting the monitor data within the selected detection time range into a converted signal; predicting a pattern shape of the sample based on the converted signal; calculating a correction quantity of a processing parameter, for decreasing a deviation between the predicted pattern shape and a standard value; and converting the correction quantity of a processing parameter obtained by the calculating operation when a kind of a next sample of a next lot is different from the sample, thereby to use a converted correction quantity of the processing parameter for a processing of the next sample.

摘要翻译： 一种等离子体处理方法，用于通过使用基于批量单位的等离子体处理样品，包括：使用多个传感器检测作为与样品的处理状态相关的监测数据的多种信息; 选择检测到的监视数据的检测时间范围; 将所选择的检测时间范围内的监视数据转换成转换信号; 基于转换的信号预测样本的图案形状; 计算处理参数的校正量，以减小预测图案形状与标准值之间的偏差; 并且当下一个批次的下一个样本的种类与样本不同时，转换通过计算操作获得的处理参数的校正量，从而使用用于下一个样本的处理的转换的处理参数的校正量。

公开(公告)号：US20050090914A1

公开(公告)日：2005-04-28

申请号：US10987121

申请日：2004-11-15

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： H01L21/205 ,  G05B23/02 ,  H01L21/00 ,  H01L21/02 ,  G05B11/01 ,  G05B15/00 ,  G05B21/02

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.

摘要翻译： 监视器数据获取部通过传感器获取与处理装置中的一个样本的处理状态有关的多个监视数据。 数据选择部从多个监视数据中选择属于包含在多个处理部中的任意处理分区的监视数据。 监视信号生成部基于属于由数据选择部选择的任意处理部的监视数据，生成监视信号。 显示设置控制器以时间序列方式在显示部分上显示关于在处理设备中处理的样本获得的多个监视信号。

公开(公告)号：US06879867B2

公开(公告)日：2005-04-12

申请号：US09945691

申请日：2001-09-05

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： H01L21/205 ,  G05B23/02 ,  H01L21/00 ,  H01L21/02 ,  G06F19/00

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.

公开(公告)号：US07376479B2

公开(公告)日：2008-05-20

申请号：US11645680

申请日：2006-12-27

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： G06F19/00

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A plasma processing method for processing a sample by using plasma on a lot unit basis, including: detecting plural kinds of information as monitor data relating to a processing state of the sample, using a plurality of sensors; selecting a detection time range of the monitor data thus detected; converting the monitor data within the selected detection time range into a converted signal; predicting a pattern shape of the sample based on the converted signal; calculating a correction quantity of a processing parameter, for decreasing a deviation between the predicted pattern shape and a standard value; and converting the correction quantity of a processing parameter obtained by the calculating operation when a kind of a next sample of a next lot is different from the sample, thereby to use a converted correction quantity of the processing parameter for a processing of the next sample.

摘要翻译： 一种等离子体处理方法，用于通过使用基于批量单位的等离子体处理样品，包括：使用多个传感器检测作为与样品的处理状态有关的监测数据的多种信息; 选择检测到的监视数据的检测时间范围; 将所选择的检测时间范围内的监视数据转换成转换信号; 基于转换的信号预测样本的图案形状; 计算处理参数的校正量，以减小预测图案形状与标准值之间的偏差; 并且当下一个批次的下一个样本的种类与样本不同时，转换通过计算操作获得的处理参数的校正量，从而使用用于下一个样本的处理的转换的处理参数的校正量。

公开(公告)号：US07158848B2

公开(公告)日：2007-01-02

申请号：US11356099

申请日：2006-02-17

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： G06F19/00

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A plasma processing apparatus for processing a sample within a vacuum vessel, including: a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data; data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus; a signal filter for converting the monitor data within the selected detection time range into an effective signal; a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and a display screen for displaying the patterned physical-shape predicted value; wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.

摘要翻译： 一种用于处理真空容器内的样品的等离子体处理装置，包括：多个传感器，用于检测与样品的处理状态相关的多种信息作为监测数据; 数据选择装置，用于选择用于监测等离子体处理装置的如此检测的监视数据的检测时间范围; 用于将所选择的检测时间范围内的监视数据转换为有效信号的信号滤波器; 模型表达单元，用于基于有效信号产生样本的图案化物理形状的预测值; 以及用于显示图案化物理形状预测值的显示屏幕; 其中显示屏幕在样品处理后不测量图案形状，显示图案化的物理形状预测值。

公开(公告)号：US20060142888A1

公开(公告)日：2006-06-29

申请号：US11356099

申请日：2006-02-17

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： G06F19/00

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A plasma processing apparatus for processing a sample within a vacuum vessel, including: a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data; data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus; a signal filter for converting the monitor data within the selected detection time range into an effective signal; a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and a display screen for displaying the patterned physical-shape predicted value; wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.

摘要翻译： 一种用于处理真空容器内的样品的等离子体处理装置，包括：多个传感器，用于检测与样品的处理状态相关的多种信息作为监测数据; 数据选择装置，用于选择用于监测等离子体处理装置的如此检测的监视数据的检测时间范围; 用于将所选择的检测时间范围内的监视数据转换为有效信号的信号滤波器; 模型表达单元，用于基于有效信号产生样本的图案化物理形状的预测值; 以及用于显示图案化物理形状预测值的显示屏幕; 其中显示屏幕在样品处理后不测量图案形状，显示图案化的物理形状预测值。

公开(公告)号：US07058467B2

公开(公告)日：2006-06-06

申请号：US10987121

申请日：2004-11-15

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： G06F19/00

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.

公开(公告)号：US06881352B2

公开(公告)日：2005-04-19

申请号：US10350061

申请日：2003-01-24

申请人： Akira Kagoshima ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Toshio Masuda ,  Hiroyuki Kitsunai ,  Junichi Tanaka ,  Natsuyo Morioka ,  Kenji Tamaki

发明人： Akira Kagoshima ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Toshio Masuda ,  Hiroyuki Kitsunai ,  Junichi Tanaka ,  Natsuyo Morioka ,  Kenji Tamaki

IPC分类号： H05H1/00 ,  B01J19/08 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/66 ,  H01L21/00

CPC分类号： H01L22/20 ,  G05B19/41875 ,  G05B2219/45031 ,  H01J37/32935 ,  H01L22/26 ,  Y02P90/20 ,  Y02P90/22

摘要： A plasma processing control system and method which can suppress influences caused by disturbances. The control system includes a plasma processor for performing processing operation over a sample accommodated within a vacuum processing chamber, a sensor for monitoring process parameters during processing operation of the plasma processor, a processed-result estimation model for estimating a processed result on the basis of a monitored output of the sensor and a preset processed-result prediction equation, and an optimum recipe calculation model for calculating correction values of processing conditions on the basis of an estimated result of the processed-result estimation model in such a manner that the processed result becomes a target value. The plasma processor is controlled on the basis of a recipe generated by the optimum recipe calculation model.

摘要翻译： 一种可以抑制由干扰引起的影响的等离子体处理控制系统和方法。 控制系统包括：等离子体处理器，用于对容纳在真空处理室内的样品执行处理操作，用于在等离子体处理器的处理操作期间监视处理参数的传感器，用于基于等离子体处理器估计处理结果的处理结果估计模型 传感器的监视输出和预设处理结果预测方程，以及用于基于处理结果估计模型的估计结果计算处理条件的校正值的最佳配方计算模型，使得处理结果 成为目标值。 基于由最佳配方计算模型生成的配方来控制等离子体处理器。

公开(公告)号：US07601240B2

公开(公告)日：2009-10-13

申请号：US11346298

申请日：2006-02-03

申请人： Akira Kagoshima ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Toshio Masuda ,  Hiroyuki Kitsunai ,  Junichi Tanaka ,  Natsuyo Morioka ,  Kenji Tamaki

发明人： Akira Kagoshima ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Toshio Masuda ,  Hiroyuki Kitsunai ,  Junichi Tanaka ,  Natsuyo Morioka ,  Kenji Tamaki

IPC分类号： H01L21/00 ,  C23C16/00 ,  C23C14/00

CPC分类号： H01L22/20 ,  G05B19/41875 ,  G05B2219/45031 ,  H01J37/32935 ,  H01L22/26 ,  Y02P90/20 ,  Y02P90/22

摘要： A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.

摘要翻译： 等离子体处理系统包括：基于等离子体处理的配方对样品进行等离子体处理的第一单元;以及用于根据在第一单元中的样品的等离子体处理期间获得的监视值修改配方的第二单元。 基于改进的配方，下一个样品在第一单元中进行等离子体处理。

公开(公告)号：US20090120580A1

公开(公告)日：2009-05-14

申请号：US12351159

申请日：2009-01-09

申请人： Akira Kagoshima ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Toshio Masuda ,  Hiroyuki Kitsunai ,  Junichi Tanaka ,  Natsuyo Morioka ,  Kenji Tamaki

发明人： Akira Kagoshima ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Toshio Masuda ,  Hiroyuki Kitsunai ,  Junichi Tanaka ,  Natsuyo Morioka ,  Kenji Tamaki

IPC分类号： C23F1/08

CPC分类号： H01L22/20 ,  G05B19/41875 ,  G05B2219/45031 ,  H01J37/32935 ,  H01L22/26 ,  Y02P90/20 ,  Y02P90/22

摘要： A plasma processing apparatus includes a vacuum processing apparatus for performing a multi-step processing operation for a sample, a sensor for monitoring process parameters during at least a first step of the processing operation, a signal compression unit for compressing a signal from the sensor to generate an apparatus state signal, a worked result estimate model unit which estimates a processed result on the basis of the apparatus state signal and a set processed-result estimation equation, an optimum recipe calculation model unit which calculates corrections to processing conditions so that the processed result becomes a target value, a usable recipe selecting unit which judges validity of an optimum recipe. At a next step of the processing operation, sample processing is performed under optimum conditions on the basis of the usable recipe selected by the selected usable recipe.

摘要翻译： 等离子体处理装置包括用于对样品进行多步骤处理操作的真空处理装置，用于在处理操作的至少第一步骤中监视处理参数的传感器，用于将来自传感器的信号压缩到 生成装置状态信号，工作结果估计模型单元，其基于装置状态信号和设定的处理结果估计方程估计处理结果;最佳配方计算模型单元，其计算对处理条件的校正，使得处理 结果成为目标值，判定最佳配方的有效性的可用配方选择单元。 在处理操作的下一步骤中，基于由所选择的可用食谱选择的可用食谱，在最佳条件下进行样品处理。