摘要:
Example embodiments disclosed herein relate to determining video to play based on audio. Videos associated with the audio are determined. One of the videos to play with the audio is determined based on analysis.
摘要:
A recyclable formwork can suitably detect temperature of concrete cast contacting with the formwork in a field without spoiling the other functions of the formwork. The recyclable formwork is provided with: a main unit (1) including a plurality of ribs (3) and (4); a case (7) being housed between the ribs (3) and (4), the case (7) being fixed on a non-contact surface (1a); and a circuit housed in the case (7). A through-hole (16) is opened at a position corresponding to where the case (7) is fixed, the through-hole (16) penetrating the main unit (1) from the non-contact surface (1a) to a contact surface (2). A sensor-housing case (17) is provided with a lower portion of the case (7), the sensor-housing case (17) being inserted into the through-hole (16), a bottom face of the sensor-housing case (17) facing concrete. And, a concrete temperature-detecting sensor (19) for detecting surface temperature of the concrete is housed in the sensor-housing case (17).
摘要:
Various example embodiments relate to incentivized media delivery. In example embodiments, a media delivery device has access to a plurality of media. The device may receive an external factor from each of a plurality of remote devices. In response, the device may select media from the media storage based on the received external factors, notify each remote device of the availability of the media, and provide an incentive for acquisition of the selected media.
摘要:
There is disclosed to provide a recyclable formwork that can add the new function without spoiling the other functions of the recyclable formwork. The recyclable formwork includes: a main unit including a contact surface contacting with cast concrete, a non-contact surface being parallel and opposite to the contact surface, and a plurality of ribs outstanding from the non-contact surface to a side opposite to the non-contact surface and reinforcing the main unit; a case being housed between the plurality of ribs and being fixed on a side of the non-contact surface; and a circuit being stored in the case. A first highest point of the case at the side of the non-contact surface is not higher than a second highest point of upper ends of the plurality of the ribs.
摘要:
As a method for producing a degreasing composition in the form of a slurry, crystallization of the composition during low-temperature storage being suppressed and the composition being used for preparing a cleaning liquid having little environmental impact, provided is a method including a step of obtaining a slurry by mixing a first liquid and a powdery silicate having a particle diameter ranging from 0.2 mm to 10 mm, wherein the first liquid contains an alkaline component composed of at least one of sodium hydroxide and potassium hydroxide, an alcohol having three or fewer carbon atoms, and water; and the degreasing composition contains, with respect to the total composition, 10 mass % to 60 mass % of the alkaline component, 0.1 mass % to 5 mass % of the alcohol, 1 mass % to 50 mass % of the silicate, and 20 mass % to 50 mass % of water including hydration water of the silicate, and contains no chelating agent.
摘要:
A method for performing a plasma process using a plasma processing apparatus which includes a vacuum process chamber, an exhaust device, a mass flow controller supplying a process gas, a stage electrode which receives and holds a workpiece by adsorption, a transfer device, and a high-frequency electrical source. The method includes a first step of performing the plasma process for the workpiece in the vacuum process chamber by a corresponding recipe of predetermined recipes, a second step of acquiring apparatus parameters showing the condition of the plasma processing apparatus when a specific recipe of the predetermined recipes is executed to diagnose whether the condition of the plasma processing apparatus is good or not based on the acquired apparatus parameters.
摘要:
A plasma processing method for processing a sample by using plasma on a lot unit basis, including: detecting plural kinds of information as monitor data relating to a processing state of the sample, using a plurality of sensors; selecting a detection time range of the monitor data thus detected; converting the monitor data within the selected detection time range into a converted signal; predicting a pattern shape of the sample based on the converted signal; calculating a correction quantity of a processing parameter, for decreasing a deviation between the predicted pattern shape and a standard value; and converting the correction quantity of a processing parameter obtained by the calculating operation when a kind of a next sample of a next lot is different from the sample, thereby to use a converted correction quantity of the processing parameter for a processing of the next sample.
摘要:
The invention provides a means for estimating a self-bias voltage under arbitrary etching conditions via a simple procedure. The present invention provides a method for measuring self-bias voltage of an etching apparatus comprising an electrostatic chuck mechanism 1 and 10 for chucking a sample 2, a mechanism 13 and 14 for supplying cooling gas 12 to a rear surface of the sample 2 and controlling the pressure thereof, and a means for measuring the relative force of electrostatic chuck of the sample based on the rear surface pressure control status of the sample 2 being processed, wherein the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control of the sample 2 when high-frequency bias power is applied to the sample 2 being processed, and the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control status of the sample when high-frequency bias power is not applied to the sample being processed, and the self-bias voltage is estimated using the acquired forces of electrostatic chuck and the electrostatic chuck voltages corresponding to the two statuses.
摘要:
A plasma processing method for processing a sample by applying a high-frequency bias power periodically for each one period (T) which is divided along a time axis into a first sub-period (T1) for which feedback control of a CD gain is executed, a second sub-period (T2) for which feedback control of a select ratio is executed, and a third sub-period (T3) for which feedback control of both the CD gain and the select ratio are executed. The applied power is set at a large value in the first sub-period, and a duty ratio T1/T is controlled in accordance with the CD gain. A plurality of samples are processed with preset process conditions, and feedback control for each processing unit of the samples is executed in accordance with a processing state of each of the samples so that an average applied power over the one period (T) is constant.
摘要:
A plasma processing apparatus for processing a sample within a vacuum vessel, including: a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data; data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus; a signal filter for converting the monitor data within the selected detection time range into an effective signal; a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and a display screen for displaying the patterned physical-shape predicted value; wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.