发明申请
US20050093668A1 COIL ON A SEMICONDUCTOR SUBSTRATE AND METHOD FOR ITS PRODUCTION 有权
半导体基板上的线圈及其制造方法

COIL ON A SEMICONDUCTOR SUBSTRATE AND METHOD FOR ITS PRODUCTION
摘要:
A coil apparatus includes a coil trace, a semiconductor substrate and a dielectric layer arranged on the semiconductor substrate, at least parts of the coil trace being arranged above a recess in the dielectric layer. The coil apparatus further includes a support apparatus arranged in the recess and connected to the coil trace for mechanically supporting the coil trace. The supporting apparatus is preferably a conductive column that is not removed when the recessed is formed in the dielectric layer.
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