发明申请
- 专利标题: COIL ON A SEMICONDUCTOR SUBSTRATE AND METHOD FOR ITS PRODUCTION
- 专利标题(中): 半导体基板上的线圈及其制造方法
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申请号: US10945849申请日: 2004-09-21
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公开(公告)号: US20050093668A1公开(公告)日: 2005-05-05
- 发明人: Kevni Bueyuektas , Klaus Koller , Karlheinz Mueller
- 申请人: Kevni Bueyuektas , Klaus Koller , Karlheinz Mueller
- 申请人地址: DE Munchen
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Munchen
- 优先权: DE10212630.5 20020321
- 主分类号: H01F17/00
- IPC分类号: H01F17/00 ; H01F41/04 ; H01L21/02 ; H01L23/522 ; H01L27/08 ; H01F27/29
摘要:
A coil apparatus includes a coil trace, a semiconductor substrate and a dielectric layer arranged on the semiconductor substrate, at least parts of the coil trace being arranged above a recess in the dielectric layer. The coil apparatus further includes a support apparatus arranged in the recess and connected to the coil trace for mechanically supporting the coil trace. The supporting apparatus is preferably a conductive column that is not removed when the recessed is formed in the dielectric layer.
公开/授权文献
信息查询
IPC分类:
H | 电学 |
H01 | 基本电气元件 |
H01F | 磁体;电感;变压器;磁性材料的选择 |
H01F17/00 | 信号类型的固定电感器 |