- 专利标题: Macrostructure modeling with microstructure reflectance slices
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申请号: US11000607申请日: 2004-12-01
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公开(公告)号: US20050099421A1公开(公告)日: 2005-05-12
- 发明人: Baining Guo , Steve Lin , Heung-Yeung Shum , Ying-Qing Xu , Yanyun Chen
- 申请人: Baining Guo , Steve Lin , Heung-Yeung Shum , Ying-Qing Xu , Yanyun Chen
- 申请人地址: US WA Redmond
- 专利权人: Microsoft Corporation
- 当前专利权人: Microsoft Corporation
- 当前专利权人地址: US WA Redmond
- 主分类号: G06T15/00
- IPC分类号: G06T15/00 ; G06T15/50 ; G06T17/00 ; G06T15/60
摘要:
A method and system for efficient synthesis of photorealistic free-form knitwear, where a single cross-section of yarn serves as the basic primitive for modeling entire articles of knitwear. This primitive, called the lumislice, describes radiance from a yarn cross-section based on fine-level interactions, including occlusion, shadowing, and multiple scattering, among yarn fibers. By representing yarn as a sequence of identical but rotated cross-sections, the lumislice can effectively propagate local microstructure over arbitrary stitch patterns and knitwear shapes. This framework accommodates varying levels of detail and capitalizes on hardware-assisted transparency blending. To further enhance realism, a technique for generating soft shadows from yarn is also introduced.
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IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06T | 一般的图像数据处理或产生 |
G06T15/00 | 3D〔三维〕图像的加工 |