- 专利标题: Nonvolatile semiconductor memory, fabrication method for the same, semiconductor integrated circuits and systems
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申请号: US11008531申请日: 2004-12-10
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公开(公告)号: US20050099847A1公开(公告)日: 2005-05-12
- 发明人: Masayuki Ichige , Koji Hashimoto , Tatsuaki Kuji , Seiichi Mori , Riichiro Shirota , Yuji Takeuchi , Koji Sakui
- 申请人: Masayuki Ichige , Koji Hashimoto , Tatsuaki Kuji , Seiichi Mori , Riichiro Shirota , Yuji Takeuchi , Koji Sakui
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 优先权: JPP2003-028413 20030205
- 主分类号: G11C16/00
- IPC分类号: G11C16/00 ; G06K17/00 ; G06K19/077 ; G11C11/34 ; G11C14/00 ; G11C16/02 ; G11C16/04 ; G11C16/06 ; H01L21/82 ; H01L21/8247 ; H01L27/10 ; H01L27/115 ; H01L29/788 ; H01L29/792
摘要:
A nonvolatile semiconductor memory which is configured to include a plurality of word lines disposed in a row direction; a plurality of bit lines disposed in a column direction perpendicular to the word lines; memory cell transistors having a charge storage layer, provided in the column direction and an electronic storage condition of the memory cell transistor configured to be controlled by one of the plurality of the word lines connected to the memory cell; a plurality of first select transistors, each including a gate electrode, selecting the memory cell transistors provided in the column direction, arranged in the column direction and adjacent to the memory cell transistors at a first end of the memory cell transistors; and a first select gate line connected to each of the gate electrodes of the first select transistors.
公开/授权文献
- US07141474B2 Fabrication method of a nonvolatile semiconductor memory 公开/授权日:2006-11-28
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