发明申请
- 专利标题: Oxygen plasma post-deposition treatment of magnetic recording media
- 专利标题(中): 磁记录介质的氧等离子体后沉积处理
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申请号: US10704593申请日: 2003-11-12
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公开(公告)号: US20050100664A1公开(公告)日: 2005-05-12
- 发明人: Chung-Hee Chang , Xiaoding Ma , Michael Stirniman , Jeffrey Reiter , Samuel Harkness , Rajiv Ranjan
- 申请人: Chung-Hee Chang , Xiaoding Ma , Michael Stirniman , Jeffrey Reiter , Samuel Harkness , Rajiv Ranjan
- 专利权人: SEAGATE TECHNOLOGY LLC
- 当前专利权人: SEAGATE TECHNOLOGY LLC
- 主分类号: B29C59/14
- IPC分类号: B29C59/14 ; G11B5/84 ; B05D5/12 ; B29C71/02
摘要:
A method of manufacturing magnetic recording media, comprising sequential steps of: (a) providing an apparatus for manufacturing the media; (b) supplying the apparatus with at least one substrate for the media; (c) forming a magnetic recording layer on the at least one substrate in a first portion of the apparatus, the magnetic recording layer including a surface; (d) treating the surface of the magnetic recording layer with an ionized oxygen-containing plasma in a second portion of the apparatus to form a plasma oxidized surface layer; and (e) forming a protective overcoat layer on the plasma oxidized surface layer of the magnetic recording layer in a third portion of the apparatus.
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