发明申请
- 专利标题: Silica-based sols
- 专利标题(中): 二氧化硅溶胶
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申请号: US10999867申请日: 2005-01-08
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公开(公告)号: US20050113462A1公开(公告)日: 2005-05-26
- 发明人: Michael Persson , Marek Tokarz , Maj-Lis Dahlgren , Hans Johansson-Vestin
- 申请人: Michael Persson , Marek Tokarz , Maj-Lis Dahlgren , Hans Johansson-Vestin
- 优先权: EP99850074.8 19990504; SE9901687-5 19990506; EP99850160.5 19991029
- 主分类号: B01J13/00
- IPC分类号: B01J13/00 ; C01B33/14 ; C01B33/141 ; C01B33/143 ; C01B33/146 ; D21H17/29 ; D21H17/37 ; D21H17/45 ; D21H17/68 ; D21H21/10 ; B01F3/12
摘要:
A process for the production of an aqueous sol containing silica-based particles which comprises (a) acidifying an aqueous silicate solution to a pH of from 1 to 4 to form an acid sol; (b) alkalising the acid sol at an SiO2 content within the range of from 4.5 to 8% by weight; (c) allowing particle growth of the alkalised sol for at least 10 minutes; or heat-treating the alkalised sol at a temperature of a least 30° C.; (d) alkalising the obtained sol to a pH of at least 10.0; and (e) optionally concentrating the sol obtained according to (b), (c) or (d) to provide an aqueous sol containing silica-based particles and having a specific surface area of at least 90 m2/g aqueous sol; as well as an aqueous sol containing silica-based particles obtainable by the process. The invention also relates to an aqueous sol containing silica-based particles which sol has a specific surface area of at least 115 m2/g aqueous sol and an S-value within the range of from 10 to 45% or contains silica-based particles having a specific surface area of at least 550 and less than 1000 m2/g SiO2. The invention further relates to the use of the aqueous sol containing silica-based particles as a drainage and retention aid in the production of paper as well as a process for the production of paper from an aqueous suspension containing cellulosic fibres, and optional filler, in which silica-based particles and at least one charged organic polymer are added to the cellulosic suspension.
公开/授权文献
- US07919535B2 Silica-based sols 公开/授权日:2011-04-05
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