发明申请
- 专利标题： Shower head structure for processing semiconductor
- 专利标题（中）： 用于加工半导体的淋浴头结构
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申请号： US10505169申请日： 2003-02-28
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公开(公告)号： US20050118737A1公开(公告)日： 2005-06-02
- 发明人: Toshio Takagi , Takeshi Sakuma , Yuji Kato , Kenji Matsumoto
- 申请人： Toshio Takagi , Takeshi Sakuma , Yuji Kato , Kenji Matsumoto
- 优先权： JP200254541 20020228; JP2002177192 20020618; JP2002365813 20021217
- 国际申请： PCT/JP03/02327 WO 20030228
- 主分类号： C23C16/52
- IPC分类号： C23C16/52 ; H01J37/32 ; H01L21/00 ; H01L21/3065 ; H01L21/31 ; H01L21/66 ; C23C16/00 ; G01R31/26 ; H01L21/44
摘要：
A shower head structure disposed in a device 2 for processing a semiconductor while supplying processing gas to a processing space S for storing a heated processed substrate W, comprising a shower head 12 having a plurality of gas injection holes 20B for supplying the processing gas and a light introducing rod 68 of a radiation thermometer 66 inserted into at least one of the gas injection holes 20B.
公开/授权文献
- US07540923B2 Shower head structure for processing semiconductor 公开/授权日：2009-06-02