发明申请
US20050119378A1 Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
有权
低分散度可光成像丙烯酸聚合物，光致抗蚀剂和微光刻工艺
- 专利标题： Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
- 专利标题（中）： 低分散度可光成像丙烯酸聚合物，光致抗蚀剂和微光刻工艺
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申请号： US10943063申请日： 2004-09-16
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公开(公告)号： US20050119378A1公开(公告)日： 2005-06-02
- 发明人: William Farnham , Michael Fryd , Frank Schadt
- 申请人： William Farnham , Michael Fryd , Frank Schadt
- 主分类号： C07C35/29
- IPC分类号： C07C35/29 ; C07C69/54 ; C08F2/38 ; C08F20/10 ; C08F20/22 ; C09D133/14 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; C08K5/34 ; C08F4/00 ; C08K5/00
摘要：
The invention pertains to low polydispersity acrylic polymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity polymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.
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