发明申请
- 专利标题： Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
- 专利标题（中）： 光刻投影装置，其中使用的反射器组件和装置制造方法
-
申请号： US11034260申请日： 2005-01-13
-
公开(公告)号： US20050148210A1公开(公告)日： 2005-07-07
- 发明人: Levinus Bakker , Jeroen Jonkers , Frank Pieter Schuurmans , Hugo Visser
- 申请人： Levinus Bakker , Jeroen Jonkers , Frank Pieter Schuurmans , Hugo Visser
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP02078390.8 20020815
- 主分类号： G21K1/06
- IPC分类号： G21K1/06 ; G03F7/20 ; G21K5/00 ; G21K5/02 ; H01L21/027 ; B05C5/00 ; H01L21/311
摘要：
A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.
公开/授权文献
信息查询
