发明申请
US20050153059A1 Partial plating method, partially-plated resin base, method for manufacturing multilayered circuit board
审中-公开
部分镀覆方法,部分镀覆树脂基底,多层电路板的制造方法
- 专利标题: Partial plating method, partially-plated resin base, method for manufacturing multilayered circuit board
- 专利标题(中): 部分镀覆方法,部分镀覆树脂基底,多层电路板的制造方法
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申请号: US10505733申请日: 2003-02-27
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公开(公告)号: US20050153059A1公开(公告)日: 2005-07-14
- 发明人: Yasuhiro Wakizaka
- 申请人: Yasuhiro Wakizaka
- 优先权: JP2002-54807 20020228
- 国际申请: PCT/JP03/02230 WO 20030227
- 主分类号: C23C18/16
- IPC分类号: C23C18/16 ; C23C18/20 ; H05K3/18 ; H05K3/38 ; H05K3/46 ; B05D5/12 ; C25D5/54 ; H05K3/00
摘要:
Disclosed is a partial plating process for forming a patterned plating layer on a surface of a resin substrate. The partial plating process of the present invention comprises the following steps: subjecting the surface of the resin substrate to oxidation treatment, causing a compound, which has a structure capable of coordination to a metal atom or metal ion, to adhere in a pattered form on the oxidation-treated surface to form an initiator pattern, forming a plating layer on the initiator pattern by electroless plating, and allowing the plating layer to grow to a desired thickness, as needed. This invention also relates to partially plated resin substrates obtained by the process, and to a process for manufacturing multilayered circuit boards by using the partial plating process.
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