发明申请
US20050161433A1 Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method 有权
涂覆有机物质的材料的表面的等离子体清洗方法以及用于实施所述方法的装置

Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
摘要:
The invention relates to a method of cleaning the surface of a material (4) that is coated with an organic substance. The inventive method is characterised in that it comprises the following steps, consisting in: introducing the material (4) into a treatment chamber (2), having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode (5a, 5b, 5c, 5d, 5e, 5f, 5g) in order to break down the organic substance under the action of the free radicals O thus produced. The invention also relates to an installation (1) that is used to carry out said method.
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