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公开(公告)号：US20190093210A1
公开(公告)日：2019-03-28
申请号：US16198388
申请日：2018-11-21
申请人： Eric Silberberg , Luc VanHee , Bruno Schmitz , Maxime Monnoyer
发明人： Eric Silberberg , Luc VanHee , Bruno Schmitz , Maxime Monnoyer
摘要： The present invention relates to a vacuum deposition facility for depositing a metal alloy coating on a substrate (7), said facility being equipped with a vapour generator/mixer comprising a vacuum chamber (6) in the form of an enclosure provided with means for creating a vacuum state therein relative to the external environment and provided with means for the entry and exit of the substrate (7), while still being essentially sealed from the external environment, said enclosure including a vapour deposition head, called the injector (3), configured so as to create a jet of metal alloy vapour of sonic velocity towards the surface of the substrate (7) and perpendicular thereto, said ejector (3) being in sealed communication with a separate mixer device (14), which is itself connected upstream to at least two crucibles (11, 12) respectively, these containing different metals M1 and M2 in liquid form, each crucible (11, 12) being connected to the mixer (14) by its own pipe (4, 4′).
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2.发明申请Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method 有权涂覆有机物质的材料的表面的等离子体清洗方法以及用于实施所述方法的装置公开(公告)号：US20050161433A1
公开(公告)日：2005-07-28
申请号：US10504596
申请日：2003-02-19
CPC分类号： H01J37/32348 , B08B7/0035 , C23G5/00
摘要： The invention relates to a method of cleaning the surface of a material (4) that is coated with an organic substance. The inventive method is characterised in that it comprises the following steps, consisting in: introducing the material (4) into a treatment chamber (2), having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode (5a, 5b, 5c, 5d, 5e, 5f, 5g) in order to break down the organic substance under the action of the free radicals O thus produced. The invention also relates to an installation (1) that is used to carry out said method.
摘要翻译： 本发明涉及一种清洁涂有有机物质的材料（4）的表面的方法。 本发明的方法的特征在于其包括以下步骤：将材料（4）引入处理室（2）中，其中压力为10mbar和1bar之间，其中供给含有 至少90体积％的氧气; 并通过使材料的表面和电介质覆盖的电极（5a，5b，5c，5d，5e，5f，5g）之间的放电进行放电来产生等离子体，以便分解有机物 在由此产生的自由基O的作用下的物质。 本发明还涉及一种用于执行所述方法的装置（1）。
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公开(公告)号：US10711339B2
公开(公告)日：2020-07-14
申请号：US16198388
申请日：2018-11-21
申请人： Eric Silberberg , Luc VanHee , Bruno Schmitz , Maxime Monnoyer
发明人： Eric Silberberg , Luc VanHee , Bruno Schmitz , Maxime Monnoyer
摘要： A method deposits a metal alloy coating on a substrate using a vacuum deposition facility. The facility is equipped with a vapour generator/mixer comprising a vacuum chamber enclosure provided with an inlet and an outlet for the substrate. The enclosure includes a vapour deposition head and an ejector is provided to create a jet of metal alloy vapour of sonic velocity towards the surface of the substrate and perpendicular thereto. The ejector is in sealed communication with a separate mixer device, which is itself connected upstream to at least two crucibles respectively, these containing different metals in liquid form, each crucible being connected to the mixer by its own pipe. The method uses a series of partitions to create alternating layers of metal vapours. The metal vapours enter the mixer inlet of the mixer at a velocity from 5 to 50 m/s to provide better homogeneity.
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公开(公告)号：US10011905B2
公开(公告)日：2018-07-03
申请号：US13979598
申请日：2012-01-12
申请人： Pierre Banaszak , Didier Marneffe , Bruno Schmitz , Eric Silberberg , Luc Vanhee
发明人： Pierre Banaszak , Didier Marneffe , Bruno Schmitz , Eric Silberberg , Luc Vanhee
CPC分类号： C23C16/54 , C23C14/16 , C23C14/246 , C23C14/562
摘要： The present invention relates to a facility for the continuous vacuum deposition of a metal coating on a substrate in motion, comprising a vacuum deposition enclosure (24), at least one vapor jet deposition head (25,26) connected to an evaporator pot (9) designed to contain the coating metal in liquid form (11), through a vapor supply pipe (20) provided with a distribution valve (19), and a melting furnace (1) for said metal, said furnace being at atmospheric pressure, located below the lowest portion of the evaporator pot (9) and connected to the evaporator pot (9) by at least one automatic supply pipe (8) of the evaporator pot (9) provided with a supply pump (6) and by at least one liquid metal return pipe (8A,18) optionally provided with a valve (16,17), regulating means for the supply pump (6) further being present to regulate a determined liquid metal level in the evaporator pot (9), characterized in that it comprises, in each said supply and return pipes (8; 8A,18), a so-called heat valve area (7,13,15) provided with a heating device and a cooling device to obtain a regulated temperature, independent of that of the melting furnace (1), that prevailing in the remaining portion of said pipes (8,8A,18) and in the evaporator pipe (9), to melt or solidify the metal found in that location.
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5.发明授权Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method 有权涂覆有机物质的材料的表面的等离子体清洗方法以及用于实施所述方法的装置公开(公告)号：US08877003B2
公开(公告)日：2014-11-04
申请号：US12631193
申请日：2009-12-04
IPC分类号： C23F1/00 , H01L21/306 , B08B7/00 , H01J37/32 , C23G5/00
CPC分类号： H01J37/32348 , B08B7/0035 , C23G5/00
摘要： The invention relates to a method of cleaning the surface of a material that is coated with an organic substance. The inventive method is characterized in that it comprises the following steps, consisting in: introducing the material into a treatment chamber, having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode in order to break down the organic substance under the action of the free radicals O thus produces. The invention also relates to an installation that is used to carry out said method.
摘要翻译： 本发明涉及清洁涂有有机物质的材料的表面的方法。 本发明的方法的特征在于其包括以下步骤：将材料引入处理室中，其中压力为10mbar和1bar之间，其中供给含有至少90体积％ 氧; 并通过在材料表面和电介质覆盖的电极之间通过放电来产生等离子体，以便在由此产生的自由基O的作用下分解有机物质。 本发明还涉及一种用于执行所述方法的装置。
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6.发明申请公开(公告)号：US20130239890A1
公开(公告)日：2013-09-19
申请号：US13870351
申请日：2013-04-25
IPC分类号： C23C16/06
CPC分类号： C23C16/06 , C23C14/16 , C23C14/24 , C23C14/562 , C23C16/45563
摘要： The present invention provides a process for coating a substrate. A metal alloy layer including at least two metallic elements is continuously deposited on the substrate by a vacuum deposition facility. The facility includes a vapor jet coater for spraying the substrate with a vapor containing the metallic elements in a constant and predetermined relative content, the vapor being sprayed at a sonic velocity. The process may advantageously be used for depositing Zn—Mg coatings. The invention also provides a vacuum deposition facility for continuously depositing coatings formed from metal alloys, for implementing the process.
摘要翻译： 本发明提供一种涂布基材的方法。 包括至少两个金属元素的金属合金层通过真空沉积设备在基板上连续沉积。 该设备包括蒸气喷涂涂布机，用于以恒定和预定的相对含量喷涂含有金属元素的蒸气的基底，蒸气以声速喷射。 该方法可有利地用于沉积Zn-Mg涂层。 本发明还提供一种用于连续沉积由金属合金形成的涂层的真空沉积设备，用于实施该方法。
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7.发明授权公开(公告)号：US08481120B2
公开(公告)日：2013-07-09
申请号：US12532043
申请日：2008-03-19
CPC分类号： C23C16/06 , C23C14/16 , C23C14/24 , C23C14/562 , C23C16/45563
摘要： The invention relates to a process for coating a substrate (S) whereby a metal alloy layer comprising at least two metallic elements is continuously deposited on the substrate (S) by means of a vacuum deposition facility (1) comprising a vapor jet coater (7) for spraying the substrate (S) with a vapor containing the metallic elements in a constant and predetermined relative content, the vapor being sprayed at a sonic velocity. The process is more particularly intended for depositing Zn—Mg coatings.The invention also relates to a vacuum deposition facility (1) for continuously depositing coatings formed from metal alloys, for implementing the process.
摘要翻译： 本发明涉及一种用于涂覆基材（S）的方法，由此通过包括蒸气喷射涂布机（7）的真空沉积设备（1）将包含至少两个金属元素的金属合金层连续地沉积在基板（S）上， ），用含有金属元素的蒸气以恒定和预定的相对含量喷涂基材（S），蒸气以声速喷射。 该方法更特别地用于沉积Zn-Mg涂层。 本发明还涉及一种用于连续沉积由金属合金形成的涂层的真空沉积设备（1），用于实施该方法。
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公开(公告)号：US20100139864A1
公开(公告)日：2010-06-10
申请号：US12631193
申请日：2009-12-04
CPC分类号： H01J37/32348 , B08B7/0035 , C23G5/00
摘要： The invention relates to a method of cleaning the surface of a material that is coated with an organic substance. The inventive method is characterized in that it comprises the following steps, consisting in: introducing the material into a treatment chamber, having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode in order to break down the organic substance under the action of the free radicals O thus produces. The invention also relates to an installation that is used to carry out said method.
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9.发明申请公开(公告)号：US20100104752A1
公开(公告)日：2010-04-29
申请号：US12532043
申请日：2008-03-19
IPC分类号： C23C16/442 , C23C16/00 , C22C23/04 , C22C18/00 , C23C16/54
CPC分类号： C23C16/06 , C23C14/16 , C23C14/24 , C23C14/562 , C23C16/45563
摘要： The invention relates to a process for coating a substrate (S) whereby a metal alloy layer comprising at least two metallic elements is continuously deposited on the substrate (S) by means of a vacuum deposition facility (1) comprising a vapor jet coater (7) for spraying the substrate (S) with a vapor containing the metallic elements in a constant and predetermined relative content, the vapor being sprayed at a sonic velocity. The process is more particularly intended for depositing Zn—Mg coatings.The invention also relates to a vacuum deposition facility (1) for continuously depositing coatings formed from metal alloys, for implementing the process.
摘要翻译： 本发明涉及一种用于涂覆基材（S）的方法，由此通过包括蒸气喷射涂布机（7）的真空沉积设备（1）将包含至少两个金属元素的金属合金层连续地沉积在基板（S）上， ），用含有金属元素的蒸气以恒定和预定的相对含量喷涂基材（S），蒸气以声速喷射。 该方法更特别地用于沉积Zn-Mg涂层。 本发明还涉及一种用于连续沉积由金属合金形成的涂层的真空沉积设备（1），用于实施该方法。
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公开(公告)号：US11434560B2
公开(公告)日：2022-09-06
申请号：US12681969
申请日：2008-10-10
申请人： Pierre Banaszak , Didier Marneffe , Eric Silberberg , Luc Vanhee
发明人： Pierre Banaszak , Didier Marneffe , Eric Silberberg , Luc Vanhee
摘要： The invention relates to a vapour generator for the deposition of a metal coating onto a substrate (7), preferably a steel strip, that comprises a vacuum chamber (6) in the form of a housing including a vapour deposition head or ejector (3) in tight communication via a supply duct (4) with at least one crucible (1) containing the coating metal in a liquid form and located outside the vacuum chamber (6), characterised in that the ejector (3) includes a longitudinal slot for the vapour outlet acting as a sonic throat and extending on the entire width of the substrate (7), a filtration medium or a charge loss member (3A) made of a sintered material being provided in the ejector immediately before said slot on the vapour path in order to equalise the flow speed of the vapour exiting the ejector (3) through the sonic throat.
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