公开(公告)号：US12054689B2

公开(公告)日：2024-08-06

申请号：US17911578

申请日：2021-03-02

申请人： Chemische Fabrik Budenheim KG

发明人： Marvin Bargon ,  Steffen Bugner ,  Dirk Masurat ,  Andrej Weber

IPC分类号： C10M141/02 ,  C10M125/22 ,  C10M125/24 ,  C10M125/26 ,  C10M129/30 ,  C10M129/38 ,  C23G5/00 ,  C10N10/02 ,  C10N40/20 ,  C10N50/08

CPC分类号： C10M141/02 ,  C10M125/22 ,  C10M125/24 ,  C10M125/26 ,  C10M129/30 ,  C10M129/38 ,  C23G5/00 ,  C10M2201/084 ,  C10M2201/085 ,  C10M2201/087 ,  C10M2207/122 ,  C10M2207/126 ,  C10N2010/02 ,  C10N2040/241 ,  C10N2040/242 ,  C10N2040/246 ,  C10N2050/08

摘要： A composition for lubricating and/or descaling in the hot processing of metals includes a solid mixture containing the following constituents:



(a) 20 to 60% by weight of condensed alkali phosphate,
(b) 10 to 40% by weight boron compound selected from borosilicate glass, boric acid, boric acid salt, or a mixture thereof,
(c) 10 to 30% by weight alkali or alkaline earth sulphates,
(d) 5 to 25% by weight fatty acid, fatty acid salt, or a mixture thereof. The sum of the constituents (a) and (b) constitutes at least 50% by weight of the mixture and the sum of the constituents (a) to (d) constitutes at least 85% by weight of the mixture.

公开(公告)号：US20240150902A1

公开(公告)日：2024-05-09

申请号：US17983713

申请日：2022-11-09

申请人： GENERAL ELECTRIC COMPANY

发明人： Jonathan Matthew Lomas ,  Shan Liu ,  Michael Anthony DePalma ,  Malorie Myers Burnette ,  James C. Dalton

IPC分类号： C23G5/00 ,  B01F23/10 ,  B01F25/312 ,  B08B5/02 ,  B08B13/00 ,  F01D25/00

CPC分类号： C23G5/00 ,  B01F23/191 ,  B01F25/31252 ,  B08B5/02 ,  B08B13/00 ,  F01D25/002

摘要： A fluoride ion cleaning system is provided. The system includes a retort including an interior sized to receive at least one component therein. The at least one component has a target area defined thereon. The system also includes a gas distribution system. The gas distribution system includes a manifold configured to provide reaction gas within the interior, a flow modulator configured to agitate the reaction gas within the interior, and at least one nozzle in flow communication with the flow modulator. The at least one nozzle is adapted to define an agitated flow of reaction gas at the target area of the at least one component.

公开(公告)号：US20240055224A1

公开(公告)日：2024-02-15

申请号：US18383943

申请日：2023-10-26

申请人： Atmospheric Plasma Solutions, Inc.

发明人： Peter Joseph Yancey

IPC分类号： H01J37/32 ,  B08B7/00 ,  B44D3/16 ,  C23G5/00

CPC分类号： H01J37/32009 ,  B08B7/0035 ,  B44D3/16 ,  C23G5/00 ,  H05H1/2481

摘要： In a method is provided for removing a material from a substrate, a plasma is generated at atmospheric pressure. The plasma includes an energetic species reactive with one or more components of the material. The plasma is flowed from an outlet as a plasma plume that includes periodic regions of high plasma density and low plasma density. The material is exposed to the plasma plume. At least one component of the material reacts with the energetic species, and at least one other component of the material is physically impacted and moved by one or more of the regions of high plasma density.

公开(公告)号：US20230357662A1

公开(公告)日：2023-11-09

申请号：US17911578

申请日：2021-03-02

申请人： Chemische Fabrik Budenheim KG

发明人： Marvin BARGON ,  Steffen BUGNER ,  Dirk MASURAT ,  Andrej WEBER

IPC分类号： C10M141/02 ,  C10M125/22 ,  C10M125/24 ,  C10M125/26 ,  C10M129/30 ,  C10M129/38 ,  C23G5/00

CPC分类号： C10M141/02 ,  C10M125/22 ,  C10M125/24 ,  C10M125/26 ,  C10M129/30 ,  C10M129/38 ,  C23G5/00 ,  C10M2201/085 ,  C10M2201/084 ,  C10M2201/087 ,  C10M2207/126 ,  C10M2207/122 ,  C10N2010/02

摘要： A composition for lubricating and/or descaling in the hot processing of metals includes a solid mixture containing the following constituents:



(a) 20 to 60% by weight of condensed alkali phosphate,
(b) 10 to 40% by weight boron compound selected from borosilicate glass, boric acid, boric acid salt, or a mixture thereof,
(c) 10 to 30% by weight alkali or alkaline earth sulphates,
(d) 5 to 25% by weight fatty acid, fatty acid salt, or a mixture thereof. The sum of the constituents (a) and (b) constitutes at least 50% by weight of the mixture and the sum of the constituents (a) to (d) constitutes at least 85% by weight of the mixture.

公开(公告)号：US20230092003A1

公开(公告)日：2023-03-23

申请号：US17908934

申请日：2021-03-03

申请人： Atotech Deutschland GmbH & Co. KG

发明人： Udo HOFMANN

IPC分类号： C11D7/20 ,  C11D11/00 ,  C11D17/00 ,  B01J20/12 ,  C23G5/00

摘要： This invention is related to a process for purification of metallic objects comprising an oil-adsorbing step in the presence of a liquid and a layer silicate component.

公开(公告)号：US20220195610A1

公开(公告)日：2022-06-23

申请号：US17594934

申请日：2020-07-17

申请人： NIPPON STEEL CORPORATION

发明人： Mikiko NOGUCHI ,  Takashi YAMAGUCHI

IPC分类号： C23G1/08 ,  C22C38/52 ,  C22C38/50 ,  C22C38/48 ,  C22C38/46 ,  C22C38/44 ,  C22C38/42 ,  C22C38/06 ,  C22C38/04 ,  C22C38/02 ,  C22C38/00 ,  C23G5/00 ,  C23G3/04

摘要： A method of manufacturing a martensitic stainless steel pipe includes: preparing a hollow shell, S1; a pickling step, S3-2, in which the hollow shell is immersed in nitrohydrofluoric acid solution at a temperature below 50° C.; after pickling step S3-2, a high-pressure water washing step, S4, in which high-pressure water is injected onto the outer surface of the hollow shell to clean the outer surface of the hollow shell; after high-pressure water washing step S4, a hot-water immersion step, S5, in which the hollow shell is immersed in hot water if necessary; and spraying gas onto the surface of the hollow shell, S6, before a lapse of 15 minutes from completion of high-pressure water washing step S4 or hot-water immersion step S5.

公开(公告)号：US20220081779A1

公开(公告)日：2022-03-17

申请号：US17471625

申请日：2021-09-10

申请人： LG ELECTRONICS INC.

发明人： Sangheon SONG ,  Jin Woo Shim ,  Jong Hun Lim ,  Younghyun Park

IPC分类号： C23G5/00 ,  C01B32/50 ,  C11D7/02 ,  C11D11/00 ,  C23D5/02

摘要： The present disclosure relates to a treating method of a metal surface, and a coating method thereof using the same. A treating method of a metal surface may include grinding solid carbon dioxide and then spraying the ground solid carbon dioxide onto a metal surface. After spraying the ground solid carbon dioxide, irradiating short-wavelength ultraviolet rays on the metal surface, thereby removing foreign substances attached to the metal surface, reforming the metal surface into a hydrophilic surface and improving wettability of a coating material.

公开(公告)号：US11183367B2

公开(公告)日：2021-11-23

申请号：US16881868

申请日：2020-05-22

申请人： ASM IP Holding B.V.

发明人： Tom E. Blomberg ,  Varun Sharma ,  Suvi Haukka ,  Marko Tuominen ,  Chiyu Zhu

IPC分类号： H01J37/32 ,  C23F1/12 ,  H01L21/311 ,  C23G5/00 ,  H01L21/3213

摘要： Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase non-metal halide reactant and a second vapor phase halide reactant. In some embodiments both the first and second reactants are chloride reactants. In some embodiments the first reactant is fluorinating gas and the second reactant is a chlorinating gas. In some embodiments a thermal ALE cycle is used in which the substrate is not contacted with a plasma reactant.

公开(公告)号：US10894301B2

公开(公告)日：2021-01-19

申请号：US15398201

申请日：2017-01-04

申请人： THYSSENKRUPP RASSELSTEIN GMBH

发明人： Benjamin Liebscher ,  Andreas Tschage

IPC分类号： B23K26/354 ,  B23K26/402 ,  B08B7/00 ,  B23K101/12 ,  B23K103/08 ,  B44D3/16 ,  B23K11/34 ,  B23K101/34 ,  C23G5/00

摘要： A method of removing a coating made of an organic material, in particular an organic lacquer or a polymer coating, which adheres to the surface of tin-plated sheet steel. In a first step, the tin layer of the tin-plated sheet steel is completely or incipiently melted by exposure to electromagnetic radiation with a predefined wavelength, to which the organic coating is at least primarily transparent, with the organic coating becoming detached from tin layer, and in a second step, the organic material of the coating which detached from the tin layer is removed.

公开(公告)号：US20200312620A1

公开(公告)日：2020-10-01

申请号：US16881868

申请日：2020-05-22

申请人： ASM IP Holding B.V.

发明人： Tom E. Blomberg ,  Varun Sharma ,  Suvi Haukka ,  Marko Tuominen ,  Chiyu Zhu

IPC分类号： H01J37/32 ,  C23F1/12 ,  H01L21/311 ,  C23G5/00 ,  H01L21/3213

摘要： Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase non-metal halide reactant and a second vapor phase halide reactant. In some embodiments both the first and second reactants are chloride reactants. In some embodiments the first reactant is fluorinating gas and the second reactant is a chlorinating gas. In some embodiments a thermal ALE cycle is used in which the substrate is not contacted with a plasma reactant.