发明申请
US20050163926A1 Method of forming a coating film 有权
形成涂膜的方法

Method of forming a coating film
摘要:
The method comprises the steps of applying a masking agent at part of a surface of the substrate, depositing the coating film over at least part of the surface of the substrate which is covered by the masking agent and over at least part of the surface of the substrate which is free of the masking agent and removing the masking agent from the substrate. The masking agent is preferably removed by the application of water.
公开/授权文献
信息查询
0/0