Invention Application
- Patent Title: Method and apparatus for monitoring tool performance
- Patent Title (中): 用于监控工具性能的方法和装置
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Application No.: US10987194Application Date: 2004-11-15
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Publication No.: US20050171627A1Publication Date: 2005-08-04
- Inventor: Merritt Funk , Masaki Tozawa
- Applicant: Merritt Funk , Masaki Tozawa
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Main IPC: H01L21/02
- IPC: H01L21/02 ; G05B19/4065 ; G06F19/00 ; H01L21/00

Abstract:
A method and system for monitoring tool performance for processing tools in a semiconductor processing system. The semiconductor processing system includes a number of processing tools, a number of processing modules, a number of sensors, and an alarm management system. A tool health control strategy is executed in which tool health data for the processing tool is collected. A tool health analysis strategy is executed in which the tool health data is analyzed. An intervention manager can pause the processing tool when an alarm has occurred. The intervention manager refrains from pausing the processing tool when an alarm has not occurred.
Public/Granted literature
- US07113838B2 Method and apparatus for monitoring tool performance Public/Granted day:2006-09-26
Information query
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