- 专利标题: Semiconductor integrated circuit device with reduced leakage current
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申请号: US11104488申请日: 2005-04-13
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公开(公告)号: US20050174141A1公开(公告)日: 2005-08-11
- 发明人: Kenichi Osada , Koichiro Ishibashi , Yoshikazu Saitoh , Akio Nishida , Masaru Nakamichi , Naoki Kitai
- 申请人: Kenichi Osada , Koichiro Ishibashi , Yoshikazu Saitoh , Akio Nishida , Masaru Nakamichi , Naoki Kitai
- 优先权: JP2001-168945 20010605; JP2002-017840 20020128
- 主分类号: G11C11/413
- IPC分类号: G11C11/413 ; G11C5/14 ; G11C11/41 ; G11C11/412 ; G11C11/417 ; H01L21/8234 ; H01L21/8238 ; H01L21/8244 ; H01L27/088 ; H01L27/092 ; H01L27/10 ; H01L27/11 ; H03K19/00 ; H03K19/195
摘要:
The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
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