发明申请
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10773461申请日： 2004-02-09
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公开(公告)号： US20050174549A1公开(公告)日： 2005-08-11
- 发明人: Paulus Duineveld , Peter Dirksen , Aleksey Kolesnychenko , Helmar Van Santen
- 申请人： Paulus Duineveld , Peter Dirksen , Aleksey Kolesnychenko , Helmar Van Santen
- 申请人地址： NL Veldhoven NL Eindhoven
- 专利权人： ASML NETHERLANDS B.V.,KONINKLIJKE PHILIPS ELECTRONICS N.V.
- 当前专利权人： ASML NETHERLANDS B.V.,KONINKLIJKE PHILIPS ELECTRONICS N.V.
- 当前专利权人地址： NL Veldhoven NL Eindhoven
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F7/20 ; G03B27/52
摘要：
An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
公开/授权文献
- US07050146B2 Lithographic apparatus and device manufacturing method 公开/授权日：2006-05-23
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