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    Double patterning for lithography to increase feature spatial density
    7.
    发明授权
    Double patterning for lithography to increase feature spatial density 有权
    用于光刻的双重图案化以增加特征空间密度

    公开(公告)号：US08148052B2

    公开(公告)日：2012-04-03

    申请号：US12514777

    申请日：2007-11-13

    申请人： Anja Monique Vanleenhove ,  Peter Dirksen ,  David Van Steenwinckel ,  Gerben Doornbos ,  Casper Juffermans ,  Mark Van Dal

    发明人： Anja Monique Vanleenhove ,  Peter Dirksen ,  David Van Steenwinckel ,  Gerben Doornbos ,  Casper Juffermans ,  Mark Van Dal

    IPC分类号： G03F7/26

    CPC分类号： G03F7/0035 ,  G03F7/11 ,  H01L21/0271 ,  H01L21/0273 ,  H01L21/823821 ,  H01L29/66795 ,  H01L29/6681 ,  H01L29/785

    摘要： A method of forming a pattern in at least one device layer in or on a substrate comprises: coating the device layer with a first photoresist layer; exposing the first photoresist using a first mask; developing the first photoresist layer to form a first pattern on the substrate; coating the substrate with a protection layer; treating the protection layer to cause a change therein where it is in contact with the first photoresist, to render the changed protection layer substantially immune to a subsequent exposure and/or developing step; coating the substrate with a second photoresist layer; exposing the second photoresist layer using a second mask; and developing the second photoresist layer to form a second pattern on the substrate without significantly affecting the first pattern in the first photoresist layer, wherein the first and second patterns together define interspersed features having a spatial frequency greater than that of the features defined in each of the first and second patterns separately. The process has particular utility in defining source, drain and fin features of finFET devices with a smaller feature size than otherwise achievable with the prevailing lithography tools.

    摘要翻译： 在衬底中或衬底上的至少一个器件层中形成图案的方法包括：用第一光致抗蚀剂层涂覆器件层; 使用第一掩模曝光第一光致抗蚀剂; 显影第一光致抗蚀剂层以在基底上形成第一图案; 用保护层涂覆基板; 处理保护层以在其中与第一光致抗蚀剂接触的地方发生变化，使得改变的保护层基本上不受随后的曝光和/或显影步骤的影响; 用第二光致抗蚀剂层涂覆基板; 使用第二掩模曝光所述第二光致抗蚀剂层; 并且显影所述第二光致抗蚀剂层以在所述基板上形成第二图案，而不会显着影响所述第一光致抗蚀剂层中的所述第一图案，其中所述第一和第二图案一起限定散布特征，其空间频率大于 第一和第二模式分开。 该方法在定义具有较小的特征尺寸的finFET器件的源极，漏极和鳍片特征方面具有特别的用途，而与主要的光刻工具不同。

    MASK INSPECTION APPARATUS AND METHOD
    8.
    发明申请
    MASK INSPECTION APPARATUS AND METHOD 审中-公开
    屏蔽检查装置和方法

    公开(公告)号：US20120039522A1

    公开(公告)日：2012-02-16

    申请号：US10597615

    申请日：2005-02-02

    申请人： Peter Dirksen ,  Thomas Steffen

    发明人： Peter Dirksen ,  Thomas Steffen

    IPC分类号： G06K9/00

    CPC分类号： G03F1/84 ,  G03F1/44

    摘要： Apparatus for optical inspection of an object, comprising: an optical imaging system (5) for generating an actual image of the real object, a calculation unit (12) for calculating an estimated image of an object of desired shape in respect of a known aberration coefficient of the optical imaging system, an image analysis unit (13) for detecting differences between the actual image and the image calculated by the calculation unit (12).

    摘要翻译： 一种用于物体光学检测的装置，包括：用于产生实际物体的实际图像的光学成像系统（5），用于计算已知像差的所需形状的物体的估计图像的计算单元（12） 光学成像系统的系数，用于检测由计算单元（12）计算出的实际图像和图像之间的差异的图像分析单元（13）。

    PROXIMITY SENSOR, IN PARTICULAR MICROPHONE FOR RECEPTION OF SOUND SIGNALS IN THE HUMAN AUDIBLE SOUND RANGE, WITH ULTRASONIC PROXIMITY ESTIMATION
    9.
    发明申请
    PROXIMITY SENSOR, IN PARTICULAR MICROPHONE FOR RECEPTION OF SOUND SIGNALS IN THE HUMAN AUDIBLE SOUND RANGE, WITH ULTRASONIC PROXIMITY ESTIMATION 有权
    接近传感器，用于接收人声可听声音范围内的声音信号的特殊麦克风，具有超声逼近估计

    公开(公告)号：US20110003614A1

    公开(公告)日：2011-01-06

    申请号：US12828482

    申请日：2010-07-01

    申请人： Geert Langereis ,  Twan van Lippen ,  Peter Dirksen ,  Frank Pasveer

    发明人： Geert Langereis ,  Twan van Lippen ,  Peter Dirksen ,  Frank Pasveer

    IPC分类号： H04R29/00 ,  H04W88/02

    CPC分类号： H04R19/005 ,  G01S15/06 ,  G01S15/876 ,  H03K17/94 ,  H03K2217/94005 ,  H04M1/6016 ,  H04M1/72569 ,  H04R19/04 ,  H04R2400/01

    摘要： Proximity sensor, particularly for usage in an electronic mobile device, comprising at least one acoustic transducer adapted for receiving acoustic signals at least in parts of the frequency range of human audible sound and emitting and/or receiving ultrasonic signals for proximity estimation. The acoustic transducer preferably is a Micro-Electro-Mechanical-Systems (MEMS) microphone. Further, a method in an electronic device comprising an acoustic transducer is provided comprising the steps of generating at least one electric signal in the frequency range of ultrasonic sound, emitting at least one ultrasonic signal by means of the acoustic transducer; receiving at least one ultrasonic signal by means of the acoustic transducer; deducing from the at least one emitted ultrasonic signal and the at least one received ultrasonic signal at least the delay between emission of the emitted ultrasonic signal and reception of the corresponding ultrasonic signal.

    摘要翻译： 特别是用于电子移动设备的接近传感器，包括至少一个声学传感器，适于在至少部分人类可听见的声音的频率范围内接收声学信号，并发射和/或接收用于邻近估计的超声波信号。 声换能器优选地是微机电系统（MEMS）麦克风。 此外，提供了一种包括声换能器的电子设备中的方法，包括以下步骤：在超声波的频率范围内产生至少一个电信号，借助于声换能器发射至少一个超声波信号; 通过声换能器接收至少一个超声波信号; 从所述至少一个发射的超声波信号和所述至少一个接收到的超声波信号中减去所发射的超声信号的发射与对应的超声波信号的接收之间的延迟。

    METHODS AND DEVICES FOR CHARACTERIZING POLARIZATION OF ILLUMINATION SYSTEM
    10.
    发明申请
    METHODS AND DEVICES FOR CHARACTERIZING POLARIZATION OF ILLUMINATION SYSTEM 审中-公开
    用于表征照明系统极化的方法和装置

    公开(公告)号：US20100215273A1

    公开(公告)日：2010-08-26

    申请号：US11993063

    申请日：2006-06-20

    申请人： Yuri Aksenov ,  Peter Dirksen ,  Peter Zandbergen ,  Michael Benndorf ,  David Van Steenwinckle

    发明人： Yuri Aksenov ,  Peter Dirksen ,  Peter Zandbergen ,  Michael Benndorf ,  David Van Steenwinckle

    IPC分类号： G06K9/46

    CPC分类号： G03F7/7085 ,  G03F1/44 ,  G03F7/70058 ,  G03F7/70566

    摘要： In a method for evaluating the polarization state of an illumination system (52) in an optical system (50), a mask (56) is provided in the optical system (50) such that an illumination beam incident on the mask (56) is adapted such as to substantially differently diffract incident components of a light beam having different polarization states. An image of the mask (56) is then obtained, using an illumination beam of the illumination system (52) of the optical system (50). The obtained image, being either an intensity plot or a structure created in a resist layer by exposing the resist layer with the image of the mask (56), is then used to extract polarization related information about the illumination system (52). The image used for evaluating may be a diffraction image of the mask.

    摘要翻译： 在用于评估光学系统（50）中的照明系统（52）的偏振状态的方法中，在光学系统（50）中设置掩模（56），使得入射在掩模（56）上的照明光束是 适于使得具有不同极化状态的光束的入射分量基本不同的衍射。 然后使用光学系统（50）的照明系统（52）的照明光束获得掩模（56）的图像。 所获得的图像是强度图或通过用掩模（56）的图像曝光抗蚀剂层在抗蚀剂层中产生的结构，然后用于提取关于照明系统（52）的偏振相关信息。 用于评估的图像可以是掩模的衍射图像。